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On the microstructure of magnesium thin films deposited by magnetron sputtering

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Abstract
Direct current magnetron sputtering (DCMS), and high power impulse magnetron sputtering (HiPIMS) are used to deposit magnesium thin films. The latter technique is characterized by a higher degree of ionization and an ion energy distribution which is significantly altered towards a higher mean ion energy. These differences between both techniques are also reflected in the obtained microstructure of the deposited Mg thin films. DCMS grown films present a rough surface, a porous microstructure and tilted columns, while films deposited by HiPIMS are smooth, dense and have straight columns. Energy and time resolved mass spectrometry show a distinct difference regarding the ion bombardment at the substrate level. The observed film differences are connected to structure zone models with as main focus the role of ion bombardment in the microstructural evolution.
Keywords
Direct-current magnetron sputtering, High power impulse magnetron sputtering, Magnesium microstructure texture, ENERGY, POWER, PRINCIPLE, CORROSION, STORAGE, HIPIMS

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MLA
Moens, Filip, et al. “On the Microstructure of Magnesium Thin Films Deposited by Magnetron Sputtering.” THIN SOLID FILMS, vol. 689, 2019, doi:10.1016/j.tsf.2019.137501.
APA
Moens, F., Schramm, I., Konstantinidis, S., & Depla, D. (2019). On the microstructure of magnesium thin films deposited by magnetron sputtering. THIN SOLID FILMS, 689. https://doi.org/10.1016/j.tsf.2019.137501
Chicago author-date
Moens, Filip, Isabella Schramm, Stéphanos Konstantinidis, and Diederik Depla. 2019. “On the Microstructure of Magnesium Thin Films Deposited by Magnetron Sputtering.” THIN SOLID FILMS 689. https://doi.org/10.1016/j.tsf.2019.137501.
Chicago author-date (all authors)
Moens, Filip, Isabella Schramm, Stéphanos Konstantinidis, and Diederik Depla. 2019. “On the Microstructure of Magnesium Thin Films Deposited by Magnetron Sputtering.” THIN SOLID FILMS 689. doi:10.1016/j.tsf.2019.137501.
Vancouver
1.
Moens F, Schramm I, Konstantinidis S, Depla D. On the microstructure of magnesium thin films deposited by magnetron sputtering. THIN SOLID FILMS. 2019;689.
IEEE
[1]
F. Moens, I. Schramm, S. Konstantinidis, and D. Depla, “On the microstructure of magnesium thin films deposited by magnetron sputtering,” THIN SOLID FILMS, vol. 689, 2019.
@article{8625434,
  abstract     = {{Direct current magnetron sputtering (DCMS), and high power impulse magnetron sputtering (HiPIMS) are used to deposit magnesium thin films. The latter technique is characterized by a higher degree of ionization and an ion energy distribution which is significantly altered towards a higher mean ion energy. These differences between both techniques are also reflected in the obtained microstructure of the deposited Mg thin films. DCMS grown films present a rough surface, a porous microstructure and tilted columns, while films deposited by HiPIMS are smooth, dense and have straight columns. Energy and time resolved mass spectrometry show a distinct difference regarding the ion bombardment at the substrate level. The observed film differences are connected to structure zone models with as main focus the role of ion bombardment in the microstructural evolution.}},
  articleno    = {{137501}},
  author       = {{Moens, Filip and Schramm, Isabella and Konstantinidis, Stéphanos and Depla, Diederik}},
  issn         = {{0040-6090}},
  journal      = {{THIN SOLID FILMS}},
  keywords     = {{Direct-current magnetron sputtering,High power impulse magnetron sputtering,Magnesium microstructure texture,ENERGY,POWER,PRINCIPLE,CORROSION,STORAGE,HIPIMS}},
  language     = {{eng}},
  pages        = {{11}},
  title        = {{On the microstructure of magnesium thin films deposited by magnetron sputtering}},
  url          = {{http://doi.org/10.1016/j.tsf.2019.137501}},
  volume       = {{689}},
  year         = {{2019}},
}

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