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Modeling reactive magnetron sputtering: Opportunities and challenges

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Materials Chemistry, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films, Surfaces and Interfaces, Metals and Alloys

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Chicago
Depla, Diederik, Koen Strijckmans, A. Dulmaa, Florian Cougnon, Robin Dedoncker, R. Schelfhout, I. Schramm, F. Moens, and Roger De Gryse. 2019. “Modeling Reactive Magnetron Sputtering: Opportunities and Challenges.” Thin Solid Films.
APA
Depla, D., Strijckmans, K., Dulmaa, A., Cougnon, F., Dedoncker, R., Schelfhout, R., Schramm, I., et al. (2019). Modeling reactive magnetron sputtering: Opportunities and challenges. Thin Solid Films.
Vancouver
1.
Depla D, Strijckmans K, Dulmaa A, Cougnon F, Dedoncker R, Schelfhout R, et al. Modeling reactive magnetron sputtering: Opportunities and challenges. Thin Solid Films. 2019;
MLA
Depla, Diederik et al. “Modeling Reactive Magnetron Sputtering: Opportunities and Challenges.” Thin Solid Films (2019): n. pag. Print.
@article{8622040,
  author       = {Depla, Diederik and Strijckmans, Koen and Dulmaa, A. and Cougnon, Florian and Dedoncker, Robin and Schelfhout, R. and Schramm, I. and Moens, F. and De Gryse, Roger},
  issn         = {0040-6090},
  journal      = {Thin Solid Films},
  keywords     = {Materials Chemistry,Electronic,Optical and Magnetic Materials,Surfaces,Coatings and Films,Surfaces and Interfaces,Metals and Alloys},
  language     = {eng},
  title        = {Modeling reactive magnetron sputtering: Opportunities and challenges},
  url          = {http://dx.doi.org/10.1016/j.tsf.2019.05.045},
  year         = {2019},
}

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