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On the cause of a double hysteresis during reactive magnetron sputtering

(2017)
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Citation

Please use this url to cite or link to this publication:

MLA
Strijckmans, Koen, Roeland Schelfhout, and Diederik Depla. “On the Cause of a Double Hysteresis During Reactive Magnetron Sputtering.” 2017. Print.
APA
Strijckmans, K., Schelfhout, R., & Depla, D. (2017). On the cause of a double hysteresis during reactive magnetron sputtering. Presented at the 14th International symposium on Sputtering and Plasma Processes (ISSP 2017).
Chicago author-date
Strijckmans, Koen, Roeland Schelfhout, and Diederik Depla. 2017. “On the Cause of a Double Hysteresis During Reactive Magnetron Sputtering.” In .
Chicago author-date (all authors)
Strijckmans, Koen, Roeland Schelfhout, and Diederik Depla. 2017. “On the Cause of a Double Hysteresis During Reactive Magnetron Sputtering.” In .
Vancouver
1.
Strijckmans K, Schelfhout R, Depla D. On the cause of a double hysteresis during reactive magnetron sputtering. 2017.
IEEE
[1]
K. Strijckmans, R. Schelfhout, and D. Depla, “On the cause of a double hysteresis during reactive magnetron sputtering,” presented at the 14th International symposium on Sputtering and Plasma Processes (ISSP 2017), Kanazawa, Japan, 2017.
@inproceedings{8612303,
  author       = {{Strijckmans, Koen and Schelfhout, Roeland and Depla, Diederik}},
  language     = {{eng}},
  location     = {{Kanazawa, Japan}},
  title        = {{On the cause of a double hysteresis during reactive magnetron sputtering}},
  url          = {{http://dx.doi.org/10.13140/RG.2.2.26989.28642}},
  year         = {{2017}},
}

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