- Author
- Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)
- Organization
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ISSP2017 Oral KoenStrijckmans.pdf
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-8612303
- MLA
- Strijckmans, Koen, et al. On the Cause of a Double Hysteresis during Reactive Magnetron Sputtering. 2017, doi:10.13140/RG.2.2.26989.28642.
- APA
- Strijckmans, K., Schelfhout, R., & Depla, D. (2017). On the cause of a double hysteresis during reactive magnetron sputtering. Presented at the 14th International symposium on Sputtering and Plasma Processes (ISSP 2017), Kanazawa, Japan. https://doi.org/10.13140/RG.2.2.26989.28642
- Chicago author-date
- Strijckmans, Koen, Roeland Schelfhout, and Diederik Depla. 2017. “On the Cause of a Double Hysteresis during Reactive Magnetron Sputtering.” In . https://doi.org/10.13140/RG.2.2.26989.28642.
- Chicago author-date (all authors)
- Strijckmans, Koen, Roeland Schelfhout, and Diederik Depla. 2017. “On the Cause of a Double Hysteresis during Reactive Magnetron Sputtering.” In . doi:10.13140/RG.2.2.26989.28642.
- Vancouver
- 1.Strijckmans K, Schelfhout R, Depla D. On the cause of a double hysteresis during reactive magnetron sputtering. In 2017.
- IEEE
- [1]K. Strijckmans, R. Schelfhout, and D. Depla, “On the cause of a double hysteresis during reactive magnetron sputtering,” presented at the 14th International symposium on Sputtering and Plasma Processes (ISSP 2017), Kanazawa, Japan, 2017.
@inproceedings{8612303,
author = {{Strijckmans, Koen and Schelfhout, Roeland and Depla, Diederik}},
language = {{eng}},
location = {{Kanazawa, Japan}},
title = {{On the cause of a double hysteresis during reactive magnetron sputtering}},
url = {{http://doi.org/10.13140/RG.2.2.26989.28642}},
year = {{2017}},
}
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