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Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

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Abstract
This study reports on the secondary electron emission (SEE) performance of atomic layer deposited MgO films, with thicknesses in the range from 5 to 25 nm, for the application in the Timed Photon Counter. In this novel, photodetector MgO is utilized as a material for the fabrication of ultrathin transmission dynodes (tynodes). Two different types of PECVD silicon oxide films are applied on top of MgO, in order to protect it against etching steps in the fabrication of tynodes and also as a prevention against aging. Applicability of these two materials as capping films is evaluated in terms of achieved secondary electron yield (SEY) of MgO after their removal. Emission of secondary electrons is known to depend on numerous physical and chemical properties of the material, such as surface roughness and chemical composition. On that account, morphological and structural properties of modified MgO are determined by atomic force microscope and x-ray photoelectron spectrometer and linked to the changes in SEE behavior. The authors demonstrate that the application of a suitable capping layer followed by its removal provides an SEY of 6.6, as opposed to the value of 4.8 recorded from the as-deposited MgO film. Furthermore, in a following experiment, they showed that annealing of MgO films at high temperatures (up to 1100 degrees C) significantly improved the secondary electron emission, elevating the SEY to 7.2.
Keywords
THIN-FILMS, REACTIVITY, GROWTH

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Chicago
Prodanovic, Violeta, Hong Wah Chan, Anil U Mane, Jeffrey W Elam, Matthias Minjauw, Christophe Detavernier, Harry van der Graaf, and Pasqualina M. Sarro. 2018. “Effect of Thermal Annealing and Chemical Treatments on Secondary Electron Emission Properties of Atomic Layer Deposited MgO.” Journal of Vacuum Science & Technology A 36 (6).
APA
Prodanovic, V., Chan, H. W., Mane, A. U., Elam, J. W., Minjauw, M., Detavernier, C., van der Graaf, H., et al. (2018). Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 36(6).
Vancouver
1.
Prodanovic V, Chan HW, Mane AU, Elam JW, Minjauw M, Detavernier C, et al. Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2018;36(6).
MLA
Prodanovic, Violeta et al. “Effect of Thermal Annealing and Chemical Treatments on Secondary Electron Emission Properties of Atomic Layer Deposited MgO.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 36.6 (2018): n. pag. Print.
@article{8609295,
  abstract     = {This study reports on the secondary electron emission (SEE) performance of atomic layer deposited MgO films, with thicknesses in the range from 5 to 25 nm, for the application in the Timed Photon Counter. In this novel, photodetector MgO is utilized as a material for the fabrication of ultrathin transmission dynodes (tynodes). Two different types of PECVD silicon oxide films are applied on top of MgO, in order to protect it against etching steps in the fabrication of tynodes and also as a prevention against aging. Applicability of these two materials as capping films is evaluated in terms of achieved secondary electron yield (SEY) of MgO after their removal. Emission of secondary electrons is known to depend on numerous physical and chemical properties of the material, such as surface roughness and chemical composition. On that account, morphological and structural properties of modified MgO are determined by atomic force microscope and x-ray photoelectron spectrometer and linked to the changes in SEE behavior. The authors demonstrate that the application of a suitable capping layer followed by its removal provides an SEY of 6.6, as opposed to the value of 4.8 recorded from the as-deposited MgO film. Furthermore, in a following experiment, they showed that annealing of MgO films at high temperatures (up to 1100 degrees C) significantly improved the secondary electron emission, elevating the SEY to 7.2.},
  articleno    = {06A102},
  author       = {Prodanovic, Violeta and Chan, Hong Wah and Mane, Anil U and Elam, Jeffrey W and Minjauw, Matthias and Detavernier, Christophe and van der Graaf, Harry and Sarro, Pasqualina M.},
  issn         = {0734-2101},
  journal      = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A},
  language     = {eng},
  number       = {6},
  pages        = {9},
  title        = {Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO},
  url          = {http://dx.doi.org/10.1116/1.5040813},
  volume       = {36},
  year         = {2018},
}

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