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Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas

(2019) CHEMISTRY OF MATERIALS. 31(5). p.1491-1499
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Materials Chemistry, General Chemistry, General Chemical Engineering

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Citation

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Chicago
Minjauw, Matthias, Hannes Rijckaert, Isabel Van Driessche, Christophe Detavernier, and Jolien Dendooven. 2019. “Nucleation Enhancement and Area-selective Atomic Layer Deposition of Ruthenium Using RuO4 and H2 Gas.” Chemistry of Materials 31 (5): 1491–1499.
APA
Minjauw, M., Rijckaert, H., Van Driessche, I., Detavernier, C., & Dendooven, J. (2019). Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas. CHEMISTRY OF MATERIALS, 31(5), 1491–1499.
Vancouver
1.
Minjauw M, Rijckaert H, Van Driessche I, Detavernier C, Dendooven J. Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas. CHEMISTRY OF MATERIALS. 2019;31(5):1491–9.
MLA
Minjauw, Matthias et al. “Nucleation Enhancement and Area-selective Atomic Layer Deposition of Ruthenium Using RuO4 and H2 Gas.” CHEMISTRY OF MATERIALS 31.5 (2019): 1491–1499. Print.
@article{8607468,
  author       = {Minjauw, Matthias and Rijckaert, Hannes and Van Driessche, Isabel and Detavernier, Christophe and Dendooven, Jolien},
  issn         = {0897-4756},
  journal      = {CHEMISTRY OF MATERIALS},
  language     = {eng},
  number       = {5},
  pages        = {1491--1499},
  title        = {Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas},
  url          = {http://dx.doi.org/10.1021/acs.chemmater.8b03852},
  volume       = {31},
  year         = {2019},
}

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