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Electrochemical copper deposition in IC manufacturing

(2002)
Author
Promoter
(UGent) and M. Heyns
Organization

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Citation

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MLA
Teerlinck, Ivo. Electrochemical Copper Deposition in IC Manufacturing. Universiteit Gent. Faculteit Wetenschappen, 2002.
APA
Teerlinck, I. (2002). Electrochemical copper deposition in IC manufacturing. Universiteit Gent. Faculteit Wetenschappen.
Chicago author-date
Teerlinck, Ivo. 2002. “Electrochemical Copper Deposition in IC Manufacturing.” Universiteit Gent. Faculteit Wetenschappen.
Chicago author-date (all authors)
Teerlinck, Ivo. 2002. “Electrochemical Copper Deposition in IC Manufacturing.” Universiteit Gent. Faculteit Wetenschappen.
Vancouver
1.
Teerlinck I. Electrochemical copper deposition in IC manufacturing. Universiteit Gent. Faculteit Wetenschappen; 2002.
IEEE
[1]
I. Teerlinck, “Electrochemical copper deposition in IC manufacturing,” Universiteit Gent. Faculteit Wetenschappen, 2002.
@phdthesis{8597969,
  author       = {Teerlinck, Ivo},
  language     = {eng},
  pages        = {x, 165},
  publisher    = {Universiteit Gent. Faculteit Wetenschappen},
  school       = {Ghent University},
  title        = {Electrochemical copper deposition in IC manufacturing},
  year         = {2002},
}