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Ultra-thin MoO3 film goes wafer-scaled nano-architectonics by atomic layer deposition

(2018) MATERIALS & DESIGN. 149. p.135-144
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MoO3, Atomic layer deposition, Semiconductor films, Electrochemical sensor, TETRAKIS DIMETHYLAMINO TITANIUM, MOLYBDENUM OXIDES, TIO2, SPECTROSCOPY, FABRICATION, ALPHA-MOO3, CATALYSTS, TRIOXIDE, RAMAN, NANOPLATELETS

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Citation

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Chicago
Xu, Hongyan, Mohammad Karbalaeiakbari, Zhenyin Hai, Zihan Wei, Lachlan Hyde, Francis Verpoort, Chenyang Xue, and Serge Zhuiykov. 2018. “Ultra-thin MoO3 Film Goes Wafer-scaled Nano-architectonics by Atomic Layer Deposition.” Materials & Design 149: 135–144.
APA
Xu, Hongyan, Karbalaeiakbari, M., Hai, Z., Wei, Z., Hyde, L., Verpoort, F., Xue, C., et al. (2018). Ultra-thin MoO3 film goes wafer-scaled nano-architectonics by atomic layer deposition. MATERIALS & DESIGN, 149, 135–144.
Vancouver
1.
Xu H, Karbalaeiakbari M, Hai Z, Wei Z, Hyde L, Verpoort F, et al. Ultra-thin MoO3 film goes wafer-scaled nano-architectonics by atomic layer deposition. MATERIALS & DESIGN. 2018;149:135–44.
MLA
Xu, Hongyan et al. “Ultra-thin MoO3 Film Goes Wafer-scaled Nano-architectonics by Atomic Layer Deposition.” MATERIALS & DESIGN 149 (2018): 135–144. Print.
@article{8592051,
  author       = {Xu, Hongyan and Karbalaeiakbari, Mohammad and Hai, Zhenyin and Wei, Zihan and Hyde, Lachlan and Verpoort, Francis and Xue, Chenyang and Zhuiykov, Serge},
  issn         = {0264-1275},
  journal      = {MATERIALS \& DESIGN},
  language     = {eng},
  pages        = {135--144},
  title        = {Ultra-thin MoO3 film goes wafer-scaled nano-architectonics by atomic layer deposition},
  url          = {http://dx.doi.org/10.1016/j.matdes.2018.04.007},
  volume       = {149},
  year         = {2018},
}

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