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On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films

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Abstract
Yttrium oxide thin films are grown by reactive magnetron sputtering. To achieve a high deposition rate, target poisoning is avoided by local oxygen addition at the substrate. In all deposited thin films only the monoclinic Y2O3 phase is observed. A strong variation in the film texture across the sample for experiments with a stationary sample stage is noticed. This inhomogeneity can be partially traced back to an uneven oxygen gas distribution. Sample rotation resolves this problem, but still the gas distribution influences both the texture and the Bragg peak positions. Several configurations for the gas supply are tested with a different number of gas distribution pipes. An overview of all experiments shows an interesting correlation between the texture coefficient and the peak position of the monoclinic (111) Bragg reflection. When the peak shifts towards higher diffraction angles, the texture coefficient drops as a higher contribution of the (402) orientation is observed. This trend however is further complicated by the exact geometrical configuration on the deposition rate, and the energy/momentum of the species arriving at the substrate. As previously reported, an increasing energy/momentum per deposited atom results in monoclinic thin films with a preferential (111) out-of-plane orientation.
Keywords
Yttrium oxide, Magnetron sputtering, Gas distribution, Texture, Y2O3 FILMS

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Citation

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MLA
Xia, Jinjiao et al. “On the Influence of Local Oxygen Addition on the Growth of Sputter Deposited Yttrium Oxide Thin Films.” SURFACE & COATINGS TECHNOLOGY 357 (2019): 768–773. Print.
APA
Xia, J., Liang, W., Miao, Q., & Depla, D. (2019). On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films. SURFACE & COATINGS TECHNOLOGY, 357, 768–773.
Chicago author-date
Xia, Jinjiao, Wenping Liang, Qiang Miao, and Diederik Depla. 2019. “On the Influence of Local Oxygen Addition on the Growth of Sputter Deposited Yttrium Oxide Thin Films.” Surface & Coatings Technology 357: 768–773.
Chicago author-date (all authors)
Xia, Jinjiao, Wenping Liang, Qiang Miao, and Diederik Depla. 2019. “On the Influence of Local Oxygen Addition on the Growth of Sputter Deposited Yttrium Oxide Thin Films.” Surface & Coatings Technology 357: 768–773.
Vancouver
1.
Xia J, Liang W, Miao Q, Depla D. On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films. SURFACE & COATINGS TECHNOLOGY. 2019;357:768–73.
IEEE
[1]
J. Xia, W. Liang, Q. Miao, and D. Depla, “On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films,” SURFACE & COATINGS TECHNOLOGY, vol. 357, pp. 768–773, 2019.
@article{8587753,
  abstract     = {Yttrium oxide thin films are grown by reactive magnetron sputtering. To achieve a high deposition rate, target poisoning is avoided by local oxygen addition at the substrate. In all deposited thin films only the monoclinic Y2O3 phase is observed. A strong variation in the film texture across the sample for experiments with a stationary sample stage is noticed. This inhomogeneity can be partially traced back to an uneven oxygen gas distribution. Sample rotation resolves this problem, but still the gas distribution influences both the texture and the Bragg peak positions. Several configurations for the gas supply are tested with a different number of gas distribution pipes. An overview of all experiments shows an interesting correlation between the texture coefficient and the peak position of the monoclinic (111) Bragg reflection. When the peak shifts towards higher diffraction angles, the texture coefficient drops as a higher contribution of the (402) orientation is observed. This trend however is further complicated by the exact geometrical configuration on the deposition rate, and the energy/momentum of the species arriving at the substrate. As previously reported, an increasing energy/momentum per deposited atom results in monoclinic thin films with a preferential (111) out-of-plane orientation.},
  author       = {Xia, Jinjiao and Liang, Wenping and Miao, Qiang and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE & COATINGS TECHNOLOGY},
  keywords     = {Yttrium oxide,Magnetron sputtering,Gas distribution,Texture,Y2O3 FILMS},
  language     = {eng},
  pages        = {768--773},
  title        = {On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2018.10.081},
  volume       = {357},
  year         = {2019},
}

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