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Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection

(2017) APPLIED SURFACE SCIENCE. 405. p.169-177
Author
Organization
Keywords
Atomic layer deposition, Monolayer WO3, Photoresponsivity, Response time, UV photodetectors, ATOMIC LAYER DEPOSITION, ULTRAVIOLET PHOTODETECTORS, OPTOELECTRONIC PROPERTIES, LIGHT-SCATTERING, PHOTOTRANSISTORS, NANOSHEETS, PHOTORESPONSE, MOLYBDENUM, IRRADIATION, DETECTIVITY

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Citation

Please use this url to cite or link to this publication:

MLA
Hai, Zhenyin et al. “Wafer-scaled Monolayer WO3 Windows Ultra-sensitive, Extremely-fast and Stable UV-A Photodetection.” APPLIED SURFACE SCIENCE 405 (2017): 169–177. Print.
APA
Hai, Z., Karbalaeiakbari, M., Xue, C., Xu, H., Hyde, L., & Zhuiykov, S. (2017). Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection. APPLIED SURFACE SCIENCE, 405, 169–177.
Chicago author-date
Hai, Zhenyin, Mohammad Karbalaeiakbari, Chenyang Xue, Hongyan Xu, Lachlan Hyde, and Serge Zhuiykov. 2017. “Wafer-scaled Monolayer WO3 Windows Ultra-sensitive, Extremely-fast and Stable UV-A Photodetection.” Applied Surface Science 405: 169–177.
Chicago author-date (all authors)
Hai, Zhenyin, Mohammad Karbalaeiakbari, Chenyang Xue, Hongyan Xu, Lachlan Hyde, and Serge Zhuiykov. 2017. “Wafer-scaled Monolayer WO3 Windows Ultra-sensitive, Extremely-fast and Stable UV-A Photodetection.” Applied Surface Science 405: 169–177.
Vancouver
1.
Hai Z, Karbalaeiakbari M, Xue C, Xu H, Hyde L, Zhuiykov S. Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection. APPLIED SURFACE SCIENCE. 2017;405:169–77.
IEEE
[1]
Z. Hai, M. Karbalaeiakbari, C. Xue, H. Xu, L. Hyde, and S. Zhuiykov, “Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection,” APPLIED SURFACE SCIENCE, vol. 405, pp. 169–177, 2017.
@article{8587693,
  author       = {Hai, Zhenyin and Karbalaei Akbari, Mohammad and Xue, Chenyang and Xu, Hongyan and Hyde, Lachlan and Zhuiykov, Serge},
  issn         = {0169-4332},
  journal      = {APPLIED SURFACE SCIENCE},
  keywords     = {Atomic layer deposition,Monolayer WO3,Photoresponsivity,Response time,UV photodetectors,ATOMIC LAYER DEPOSITION,ULTRAVIOLET PHOTODETECTORS,OPTOELECTRONIC PROPERTIES,LIGHT-SCATTERING,PHOTOTRANSISTORS,NANOSHEETS,PHOTORESPONSE,MOLYBDENUM,IRRADIATION,DETECTIVITY},
  language     = {eng},
  pages        = {169--177},
  title        = {Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection},
  url          = {http://dx.doi.org/10.1016/j.apsusc.2017.02.031},
  volume       = {405},
  year         = {2017},
}

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