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Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants

(2018) CHEMPHYSCHEM. 19(18). p.2295-2298
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Organization
Abstract
Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.
Keywords
Gemini surfactants, mesoporous materials, organosilica, self-assembly, thin films, DIELECTRIC-CONSTANT, ELASTIC-MODULUS, THIN-FILMS, POROSITY, PMOS

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MLA
Redzheb, Murad, Oguzhan Orkut Okudur, Sigrid Bernstorff, et al. “Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants.” CHEMPHYSCHEM 19.18 (2018): 2295–2298. Print.
APA
Redzheb, M., Okudur, O. O., Bernstorff, S., Juraic, K., Van Der Voort, P., & Armini, S. (2018). Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants. CHEMPHYSCHEM, 19(18), 2295–2298.
Chicago author-date
Redzheb, Murad, Oguzhan Orkut Okudur, Sigrid Bernstorff, Krunoslav Juraic, Pascal Van Der Voort, and Silvia Armini. 2018. “Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants.” Chemphyschem 19 (18): 2295–2298.
Chicago author-date (all authors)
Redzheb, Murad, Oguzhan Orkut Okudur, Sigrid Bernstorff, Krunoslav Juraic, Pascal Van Der Voort, and Silvia Armini. 2018. “Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants.” Chemphyschem 19 (18): 2295–2298.
Vancouver
1.
Redzheb M, Okudur OO, Bernstorff S, Juraic K, Van Der Voort P, Armini S. Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants. CHEMPHYSCHEM. 2018;19(18):2295–8.
IEEE
[1]
M. Redzheb, O. O. Okudur, S. Bernstorff, K. Juraic, P. Van Der Voort, and S. Armini, “Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants,” CHEMPHYSCHEM, vol. 19, no. 18, pp. 2295–2298, 2018.
@article{8575244,
  abstract     = {Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.},
  author       = {Redzheb, Murad and Okudur, Oguzhan Orkut and Bernstorff, Sigrid and Juraic, Krunoslav and Van Der Voort, Pascal and Armini, Silvia},
  issn         = {1439-4235},
  journal      = {CHEMPHYSCHEM},
  keywords     = {Gemini surfactants,mesoporous materials,organosilica,self-assembly,thin films,DIELECTRIC-CONSTANT,ELASTIC-MODULUS,THIN-FILMS,POROSITY,PMOS},
  language     = {eng},
  number       = {18},
  pages        = {2295--2298},
  title        = {Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants},
  url          = {http://dx.doi.org/10.1002/cphc.201800341},
  volume       = {19},
  year         = {2018},
}

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