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Anomalous effects in the aluminum oxide sputtering yield

Roeland Schelfhout UGent, Koen Strijckmans UGent and Diederik Depla UGent (2018) Journal of Physics D : Applied Physics. 51(15).
abstract
The sputtering yield of aluminum oxide during reactive magnetron sputtering has been quantified by a new and fast method. The method is based on the meticulous determination of the reactive gas consumption during reactive DC magnetron sputtering and has been deployed to determine the sputtering yield of aluminum oxide. The accuracy of the proposed method is demonstrated by comparing its results to the common weight loss method excluding secondary effects such as redeposition. Both methods exhibit a decrease in sputtering yield with increasing discharge current. This feature of the aluminum oxide sputtering yield is described for the first time. It resembles the discrepancy between published high sputtering yield values determined by low current ion beams and the low deposition rate in the poisoned mode during reactive magnetron sputtering. Moreover, the usefulness of the new method arises from its time-resolved capabilities. The evolution of the alumina sputtering yield can now be measured up to a resolution of seconds. This reveals the complex dynamical behavior of the sputtering yield. A plausible explanation of the observed anomalies seems to originate from the balance between retention and out-diffusion of implanted gas atoms, while other possible causes are commented.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
compound sputtering yield, aluminum oxide, reactive sputtering, discharge current, time-resolved study
journal title
Journal of Physics D : Applied Physics
volume
51
issue
15
article number
155202
pages
9 pages
publisher
IOP Publishing
ISSN
0022-3727
1361-6463
DOI
10.1088/1361-6463/aab321
UGent publication?
yes
classification
U
copyright statement
I have transferred the copyright for this publication to the publisher
id
8561819
handle
http://hdl.handle.net/1854/LU-8561819
date created
2018-05-15 10:32:32
date last changed
2018-05-15 10:35:03
@article{8561819,
  abstract     = {The sputtering yield of aluminum oxide during reactive magnetron sputtering has been quantified by a new and fast method. The method is based on the meticulous determination of the reactive gas consumption during reactive DC magnetron sputtering and has been deployed to determine the sputtering yield of aluminum oxide. The accuracy of the proposed method is demonstrated by comparing its results to the common weight loss method excluding secondary effects such as redeposition. Both methods exhibit a decrease in sputtering yield with increasing discharge current. This feature of the aluminum oxide sputtering yield is described for the first time. It resembles the discrepancy between published high sputtering yield values determined by low current ion beams and the low deposition rate in the poisoned mode during reactive magnetron sputtering. Moreover, the usefulness of the new method arises from its time-resolved capabilities. The evolution of the alumina sputtering yield can now be measured up to a resolution of seconds. This reveals the complex dynamical behavior of the sputtering yield. A plausible explanation of the observed anomalies seems to originate from the balance between retention and out-diffusion of implanted gas atoms, while other possible causes are commented.},
  articleno    = {155202},
  author       = {Schelfhout, Roeland and Strijckmans, Koen and Depla, Diederik},
  issn         = {0022-3727},
  journal      = {Journal of Physics D : Applied Physics},
  keyword      = {compound sputtering yield,aluminum oxide,reactive sputtering,discharge current,time-resolved study},
  number       = {15},
  pages        = {9},
  publisher    = {IOP Publishing},
  title        = {Anomalous effects in the aluminum oxide sputtering yield},
  url          = {http://dx.doi.org/10.1088/1361-6463/aab321},
  volume       = {51},
  year         = {2018},
}

Chicago
Schelfhout, Roeland, Koen Strijckmans, and Diederik Depla. 2018. “Anomalous Effects in the Aluminum Oxide Sputtering Yield.” Journal of Physics D : Applied Physics 51 (15).
APA
Schelfhout, R., Strijckmans, K., & Depla, D. (2018). Anomalous effects in the aluminum oxide sputtering yield. Journal of Physics D : Applied Physics, 51(15).
Vancouver
1.
Schelfhout R, Strijckmans K, Depla D. Anomalous effects in the aluminum oxide sputtering yield. Journal of Physics D : Applied Physics. IOP Publishing; 2018;51(15).
MLA
Schelfhout, Roeland, Koen Strijckmans, and Diederik Depla. “Anomalous Effects in the Aluminum Oxide Sputtering Yield.” Journal of Physics D : Applied Physics 51.15 (2018): n. pag. Print.