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Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2

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Abstract
In this paper, high-quality wafer-scale monolayer TiO2 films were synthesized via atomic layer deposition and their main characteristics were investigated. The deposited TiO2 monolayer films were subsequently utilized in photodetectors (PDs), which demonstrated considerable optoelectronic performance with ultrafast response (30 mu s) and recovery (63 mu s) time, high on/off ratio (220), good reversibility, and great long-term stability (less than 2% variation after 1000 cycles). The photoresponsivity (R-lambda) and external quantum efficiency of 0.352 A/W and 109.12% were, respectively, attained at the incident laser power density of 118 mW/cm(2) (lambda = 400 nm) and V-DS = 1 V. These photoelectrical characteristics of the monolayer TiO2-based PDs confirmed that this TiO2 nanostructure could be an excellent candidate for various smart and portable applications such as UV-detection devices, photoswitches, high-speed optical communications, and image sensors.
Keywords
Atomic layer deposition, photodetectors, titanium oxide, ATOMIC LAYER DEPOSITION, POWERED UV-PHOTODETECTOR, METAL ULTRAVIOLET PHOTODETECTOR, LOW DARK CURRENT, HIGH-PERFORMANCE, RUTILE TIO2, THIN-FILMS, RAMAN-SPECTROSCOPY, OPTICAL-PROPERTIES, NANOTUBE ARRAYS

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Chicago
Karbalaeiakbari, Mohammad, Zhenyin Hai, Stephen Depuydt, Eugene Kats, Jie Hu, and Serge Zhuiykov. 2017. “Highly Sensitive, Fast-responding, and Stable Photodetector Based on ALD-developed Monolayer TiO2.” Ieee Transactions on Nanotechnology 16 (5): 880–887.
APA
Karbalaeiakbari, M., Hai, Z., Depuydt, S., Kats, E., Hu, J., & Zhuiykov, S. (2017). Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 16(5), 880–887.
Vancouver
1.
Karbalaeiakbari M, Hai Z, Depuydt S, Kats E, Hu J, Zhuiykov S. Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2. IEEE TRANSACTIONS ON NANOTECHNOLOGY. 2017;16(5):880–7.
MLA
Karbalaeiakbari, Mohammad et al. “Highly Sensitive, Fast-responding, and Stable Photodetector Based on ALD-developed Monolayer TiO2.” IEEE TRANSACTIONS ON NANOTECHNOLOGY 16.5 (2017): 880–887. Print.
@article{8547376,
  abstract     = {In this paper, high-quality wafer-scale monolayer TiO2 films were synthesized via atomic layer deposition and their main characteristics were investigated. The deposited TiO2 monolayer films were subsequently utilized in photodetectors (PDs), which demonstrated considerable optoelectronic performance with ultrafast response (30 mu s) and recovery (63 mu s) time, high on/off ratio (220), good reversibility, and great long-term stability (less than 2\% variation after 1000 cycles). The photoresponsivity (R-lambda) and external quantum efficiency of 0.352 A/W and 109.12\% were, respectively, attained at the incident laser power density of 118 mW/cm(2) (lambda = 400 nm) and V-DS = 1 V. These photoelectrical characteristics of the monolayer TiO2-based PDs confirmed that this TiO2 nanostructure could be an excellent candidate for various smart and portable applications such as UV-detection devices, photoswitches, high-speed optical communications, and image sensors.},
  author       = {Karbalaeiakbari, Mohammad and Hai, Zhenyin and Depuydt, Stephen and Kats, Eugene and Hu, Jie and Zhuiykov, Serge},
  issn         = {1536-125X},
  journal      = {IEEE TRANSACTIONS ON NANOTECHNOLOGY},
  language     = {eng},
  number       = {5},
  pages        = {880--887},
  title        = {Highly sensitive, fast-responding, and stable photodetector based on ALD-developed monolayer TiO2},
  url          = {http://dx.doi.org/10.1109/tnano.2017.2720199},
  volume       = {16},
  year         = {2017},
}

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