Advanced search
1 file | 146.16 KB

Low implantation depth during TAVR increases the pressure exerted on the atrioventricular conduction system: a biomechanical analysis.

(2017) p.1-2
Author
Organization

Downloads

  • AbstractTemplateNationalDay2017 bothevents.pdf
    • full text
    • |
    • open access
    • |
    • PDF
    • |
    • 146.16 KB

Citation

Please use this url to cite or link to this publication:

Chicago
Rocatello, Giorgia, Nahid El Faquir, Patrick Segers, Matthieu De Beule, Peter Mortier, and Peter de Jaegere. 2017. “Low Implantation Depth During TAVR Increases the Pressure Exerted on the Atrioventricular Conduction System: a Biomechanical Analysis.” In , 1–2.
APA
Rocatello, G., El Faquir, N., Segers, P., De Beule, M., Mortier, P., & de Jaegere, P. (2017). Low implantation depth during TAVR increases the pressure exerted on the atrioventricular conduction system: a biomechanical analysis. (pp. 1–2). Presented at the National Day of Biomedical Engineering.
Vancouver
1.
Rocatello G, El Faquir N, Segers P, De Beule M, Mortier P, de Jaegere P. Low implantation depth during TAVR increases the pressure exerted on the atrioventricular conduction system: a biomechanical analysis. 2017. p. 1–2.
MLA
Rocatello, Giorgia, Nahid El Faquir, Patrick Segers, et al. “Low Implantation Depth During TAVR Increases the Pressure Exerted on the Atrioventricular Conduction System: a Biomechanical Analysis.” 2017. 1–2. Print.
@inproceedings{8547286,
  author       = {Rocatello, Giorgia and El Faquir, Nahid and Segers, Patrick and De Beule, Matthieu and Mortier, Peter and de Jaegere, Peter},
  location     = {Brussels, Belgium},
  pages        = {1--2},
  title        = {Low implantation depth during TAVR increases the pressure exerted on the atrioventricular conduction system: a biomechanical analysis.},
  year         = {2017},
}