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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

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Chicago
Minjauw, Matthias, Jolien Dendooven, Boris Capon, Christian Dussarat, Eduardo Solano Minuesa, Kilian Devloo-Casier, Jakob Kuhs, Marc Schaekers, Alessandro Coati, and Christophe Detavernier. 2016. “Thin, Low Roughness Ru Films Deposited by Thermal and Plasma Enhanced Atomic Layer Deposition Using RuO4 and H2 at Low Temperatures.” In SR-ALD Workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain).
APA
Minjauw, M., Dendooven, J., Capon, B., Dussarat, C., Solano Minuesa, E., Devloo-Casier, K., Kuhs, J., et al. (2016). Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures. SR-ALD workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain). Presented at the Workshop “Synchrotron Radiation to study Atomic Layer Deposition.”
Vancouver
1.
Minjauw M, Dendooven J, Capon B, Dussarat C, Solano Minuesa E, Devloo-Casier K, et al. Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures. SR-ALD workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain). 2016.
MLA
Minjauw, Matthias, Jolien Dendooven, Boris Capon, et al. “Thin, Low Roughness Ru Films Deposited by Thermal and Plasma Enhanced Atomic Layer Deposition Using RuO4 and H2 at Low Temperatures.” SR-ALD Workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain). 2016. Print.
@inproceedings{8543388,
  author       = {Minjauw, Matthias and Dendooven, Jolien and Capon, Boris and Dussarat, Christian and Solano Minuesa, Eduardo and Devloo-Casier, Kilian and Kuhs, Jakob and Schaekers, Marc and Coati, Alessandro and Detavernier, Christophe},
  booktitle    = {SR-ALD workshop : 12-15 June 2016, ALBA Synchrotron, Barcelona (Spain)},
  language     = {eng},
  location     = {Barcelona, Spain},
  title        = {Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures},
  url          = {https://indico.cells.es/indico/event/63/material/6/0.pdf},
  year         = {2016},
}