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Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

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Chicago
Minjauw, Matthias, Jolien Dendooven, Christian Dussarat, Eduardo Solano Minuesa, Kilian Devloo-Casier, Jakob Kuhs, Marc Schaekers, Alessandro Coati, and Christophe Detavernier. 2016. “Thin, Low Roughness Ru Films Deposited by Thermal and Plasma Enhanced Atomic Layer Deposition Using RuO4 and H2 at Low Temperatures.” In Materials for Advanced Metallization, IEEE Conference, Abstracts.
APA
Minjauw, M., Dendooven, J., Dussarat, C., Solano Minuesa, E., Devloo-Casier, K., Kuhs, J., Schaekers, M., et al. (2016). Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures. Materials for Advanced Metallization, IEEE conference, Abstracts. Presented at the 2016 IEEE Materials for Advanced Metallization conference.
Vancouver
1.
Minjauw M, Dendooven J, Dussarat C, Solano Minuesa E, Devloo-Casier K, Kuhs J, et al. Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures. Materials for Advanced Metallization, IEEE conference, Abstracts. 2016.
MLA
Minjauw, Matthias, Jolien Dendooven, Christian Dussarat, et al. “Thin, Low Roughness Ru Films Deposited by Thermal and Plasma Enhanced Atomic Layer Deposition Using RuO4 and H2 at Low Temperatures.” Materials for Advanced Metallization, IEEE Conference, Abstracts. 2016. Print.
@inproceedings{8543382,
  author       = {Minjauw, Matthias and Dendooven, Jolien and Dussarat, Christian and Solano Minuesa, Eduardo and Devloo-Casier, Kilian and Kuhs, Jakob and Schaekers, Marc and Coati, Alessandro and Detavernier, Christophe},
  booktitle    = {Materials for Advanced Metallization, IEEE conference, Abstracts},
  language     = {eng},
  location     = {Brussels, Belgium},
  title        = {Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures},
  year         = {2016},
}