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Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts

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MLA
Geenen, Filip, C Mocuta, and Christophe Detavernier. “Formation of Ultrathin, Stable and Epitaxial Silicides for Semiconductor Contacts.” 2016 13th IEEE International Conference on Solid-state and Integrated Circuit Technology (ICSICT) Proceedings. Ed. Yu-Long Jiang & Ru Huang. Piscataway, NJ, USA: IEEE, 2016. Print.
APA
Geenen, F., Mocuta, C., & Detavernier, C. (2016). Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts. In Y.-L. Jiang & R. Huang (Eds.), 2016 13th IEEE international conference on solid-state and integrated circuit technology (ICSICT) proceedings. Presented at the 13th IEEE international conference on Solid-State and Integrated Circuit Technology (ICSICT 2016), Piscataway, NJ, USA: IEEE.
Chicago author-date
Geenen, Filip, C Mocuta, and Christophe Detavernier. 2016. “Formation of Ultrathin, Stable and Epitaxial Silicides for Semiconductor Contacts.” In 2016 13th IEEE International Conference on Solid-state and Integrated Circuit Technology (ICSICT) Proceedings, ed. Yu-Long Jiang and Ru Huang. Piscataway, NJ, USA: IEEE.
Chicago author-date (all authors)
Geenen, Filip, C Mocuta, and Christophe Detavernier. 2016. “Formation of Ultrathin, Stable and Epitaxial Silicides for Semiconductor Contacts.” In 2016 13th IEEE International Conference on Solid-state and Integrated Circuit Technology (ICSICT) Proceedings, ed. Yu-Long Jiang and Ru Huang. Piscataway, NJ, USA: IEEE.
Vancouver
1.
Geenen F, Mocuta C, Detavernier C. Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts. In: Jiang Y-L, Huang R, editors. 2016 13th IEEE international conference on solid-state and integrated circuit technology (ICSICT) proceedings. Piscataway, NJ, USA: IEEE; 2016.
IEEE
[1]
F. Geenen, C. Mocuta, and C. Detavernier, “Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts,” in 2016 13th IEEE international conference on solid-state and integrated circuit technology (ICSICT) proceedings, Hangzhou, PR China, 2016.
@inproceedings{8536312,
  author       = {Geenen, Filip and Mocuta, C and Detavernier, Christophe},
  booktitle    = {2016 13th IEEE international conference on solid-state and integrated circuit technology (ICSICT) proceedings},
  editor       = {Jiang, Yu-Long and Huang, Ru},
  isbn         = {9781467397179},
  language     = {eng},
  location     = {Hangzhou, PR China},
  pages        = {3},
  publisher    = {IEEE},
  title        = {Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts},
  url          = {http://dx.doi.org/10.1109/icsict.2016.7998963},
  year         = {2016},
}

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