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Plasma enhanced atomic layer deposition of aluminium sulphide

Jakob Kuhs UGent, Zeger Hens UGent and Christophe Detavernier UGent (2017) Atomic Layer Deposition, 17th International conference, Abstracts.
Please use this url to cite or link to this publication:
author
organization
year
type
conference (poster)
publication status
published
subject
in
Atomic Layer Deposition, 17th International conference, Abstracts
conference name
17th International conference on Atomic Layer Deposition (ALD 2017)
conference location
Denver, CO, USA
conference start
2017-07-15
conference end
2017-07-18
language
English
UGent publication?
yes
classification
C3
id
8536308
handle
http://hdl.handle.net/1854/LU-8536308
date created
2017-11-06 12:18:57
date last changed
2017-12-04 12:46:27
@inproceedings{8536308,
  author       = {Kuhs, Jakob and Hens, Zeger and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 17th International conference, Abstracts},
  language     = {eng},
  location     = {Denver, CO, USA},
  title        = {Plasma enhanced atomic layer deposition of aluminium sulphide},
  year         = {2017},
}

Chicago
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. 2017. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” In Atomic Layer Deposition, 17th International Conference, Abstracts.
APA
Kuhs, J., Hens, Z., & Detavernier, C. (2017). Plasma enhanced atomic layer deposition of aluminium sulphide. Atomic Layer Deposition, 17th International conference, Abstracts. Presented at the 17th International conference on Atomic Layer Deposition (ALD 2017).
Vancouver
1.
Kuhs J, Hens Z, Detavernier C. Plasma enhanced atomic layer deposition of aluminium sulphide. Atomic Layer Deposition, 17th International conference, Abstracts. 2017.
MLA
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” Atomic Layer Deposition, 17th International Conference, Abstracts. 2017. Print.