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Plasma enhanced atomic layer deposition of aluminium sulphide

Jakob Kuhs (UGent) , Zeger Hens (UGent) and Christophe Detavernier (UGent)
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Chicago
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. 2017. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” In Atomic Layer Deposition, 17th International Conference, Abstracts.
APA
Kuhs, J., Hens, Z., & Detavernier, C. (2017). Plasma enhanced atomic layer deposition of aluminium sulphide. Atomic Layer Deposition, 17th International conference, Abstracts. Presented at the 17th International conference on Atomic Layer Deposition (ALD 2017).
Vancouver
1.
Kuhs J, Hens Z, Detavernier C. Plasma enhanced atomic layer deposition of aluminium sulphide. Atomic Layer Deposition, 17th International conference, Abstracts. 2017.
MLA
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” Atomic Layer Deposition, 17th International Conference, Abstracts. 2017. Print.
@inproceedings{8536308,
  author       = {Kuhs, Jakob and Hens, Zeger and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 17th International conference, Abstracts},
  language     = {eng},
  location     = {Denver, CO, USA},
  title        = {Plasma enhanced atomic layer deposition of aluminium sulphide},
  year         = {2017},
}