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Plasma enhanced Atomic Layer Deposition of aluminium sulphide

Jakob Kuhs UGent, Zeger Hens UGent and Christophe Detavernier UGent (2017)
Please use this url to cite or link to this publication:
author
organization
year
type
conference (poster)
publication status
published
conference name
17th International Conference on Atomic Layer Deposition
conference organizer
AVS
conference location
Denver
conference start
2017-07-15
conference end
2017-07-18
UGent publication?
yes
classification
U
id
8536308
handle
http://hdl.handle.net/1854/LU-8536308
date created
2017-11-06 12:18:57
date last changed
2017-11-06 12:23:19
@inproceedings{8536308,
  author       = {Kuhs, Jakob and Hens, Zeger and Detavernier, Christophe},
  location     = {Denver},
  title        = {Plasma enhanced Atomic Layer Deposition of aluminium sulphide},
  year         = {2017},
}

Chicago
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. 2017. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” In .
APA
Kuhs, J., Hens, Z., & Detavernier, C. (2017). Plasma enhanced Atomic Layer Deposition of aluminium sulphide. Presented at the 17th International Conference on Atomic Layer Deposition.
Vancouver
1.
Kuhs J, Hens Z, Detavernier C. Plasma enhanced Atomic Layer Deposition of aluminium sulphide. 2017.
MLA
Kuhs, Jakob, Zeger Hens, and Christophe Detavernier. “Plasma Enhanced Atomic Layer Deposition of Aluminium Sulphide.” 2017. Print.