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On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction

Filip Geenen UGent, Eduardo Solano Minuesa UGent, Cristian Mocuta, Jean Jordan-Sweet, Christian Lavoie and Christophe Detavernier UGent (2017)
abstract
Nickel-based silicides are used to contact the source and drain regions of silicon-based transistors. The growth of the silicide on these regions occurs in direct contact with a single-crystal substrate, which can induce a preferred orientation of the silicide grains. This preferred orientation, or crystalline texture, can have a significant impact on the formation, stability and electrical properties of the silicide. In this work, we have investigated the phase sequence of nickel silicides and their texture through ex situ X-ray diffraction pole figures as a function of annealing temperature and alloying species. 9nm Ni films on Si(001) substrates, optionally alloyed with 10% Co or Pt, were annealed up to 850°C and subsequently measured at the SOLEIL synchrotron. As such, we can observe that the crystalline alignment of the occurring silicides such as NiSi and δ-Ni2Si is altered through alloying. Moreover, our measurements as a function of temperature provide clear evidence on texture inheritance of fiber and epitaxial orientations, i.e. that the crystalline alignment of a formed silicide phase can be related to the alignment of the preceding phase. We suggest that texture inheritance can significantly lower the interface energy, and by consequence lower the energetic barrier for phase formation and subsequent phase growth.
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author
organization
year
type
conference
publication status
published
subject
conference name
Materials for advanced metallization conference
conference organizer
MAM
conference location
Dresden, Germany
conference start
2017-03-26
conference end
2017-03-29
UGent publication?
yes
classification
U
copyright statement
I don't know the status of the copyright for this publication
id
8536301
handle
http://hdl.handle.net/1854/LU-8536301
date created
2017-11-06 10:33:22
date last changed
2017-11-06 10:33:22
@inproceedings{8536301,
  abstract     = {Nickel-based silicides are used to contact the source and drain regions of silicon-based transistors. The growth of the silicide on these regions occurs in direct contact with a single-crystal substrate, which can induce a preferred orientation of the silicide grains. This preferred orientation, or crystalline texture, can have a significant impact on the formation, stability and electrical properties of the silicide.
In this work, we have investigated the phase sequence of nickel silicides and their texture through ex situ X-ray diffraction pole figures as a function of annealing temperature and alloying species. 9nm Ni films on Si(001) substrates, optionally alloyed with 10\% Co or Pt, were annealed up to 850{\textdegree}C and subsequently measured at the SOLEIL synchrotron. As such, we can observe that the crystalline alignment of the occurring silicides such as NiSi and \ensuremath{\delta}-Ni2Si is altered through alloying. Moreover, our measurements as a function of temperature provide clear evidence on texture inheritance of fiber and epitaxial orientations, i.e. that the crystalline alignment of a formed silicide phase can be related to the alignment of the preceding phase. We suggest that texture inheritance can significantly lower the interface energy, and by consequence lower the energetic barrier for phase formation and subsequent phase growth.},
  author       = {Geenen, Filip and Solano Minuesa, Eduardo and Mocuta, Cristian and Jordan-Sweet, Jean and Lavoie, Christian and Detavernier, Christophe},
  location     = {Dresden, Germany},
  title        = {On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction},
  year         = {2017},
}

Chicago
Geenen, Filip, Eduardo Solano Minuesa, Cristian Mocuta, Jean Jordan-Sweet, Christian Lavoie, and Christophe Detavernier. 2017. “On the Inheritance of Crystallographic Texture During the Nickel Silicide Solid-phase Reaction.” In .
APA
Geenen, F., Solano Minuesa, E., Mocuta, C., Jordan-Sweet, J., Lavoie, C., & Detavernier, C. (2017). On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction. Presented at the Materials for advanced metallization conference.
Vancouver
1.
Geenen F, Solano Minuesa E, Mocuta C, Jordan-Sweet J, Lavoie C, Detavernier C. On the inheritance of crystallographic texture during the nickel silicide solid-phase reaction. 2017.
MLA
Geenen, Filip, Eduardo Solano Minuesa, Cristian Mocuta, et al. “On the Inheritance of Crystallographic Texture During the Nickel Silicide Solid-phase Reaction.” 2017. Print.