Ghent University Academic Bibliography

Advanced

Basics of atomic layer deposition : growth characteristics and conformality

Jolien Dendooven UGent and Christophe Detavernier UGent (2017) Atomic layer deposition in energy conversion applications. p.3-40
Please use this url to cite or link to this publication:
author
organization
year
type
bookChapter
publication status
published
subject
book title
Atomic layer deposition in energy conversion applications
editor
Julien Bachmann
pages
3 - 40
publisher
Wiley-VCH
place of publication
Weinheim, Germany
ISBN
9783527339129
9783527694839
DOI
10.1002/9783527694822.ch1
language
English
UGent publication?
yes
classification
B2
copyright statement
I have transferred the copyright for this publication to the publisher
id
8536186
handle
http://hdl.handle.net/1854/LU-8536186
date created
2017-11-03 12:22:11
date last changed
2017-11-30 09:45:27
@incollection{8536186,
  author       = {Dendooven, Jolien and Detavernier, Christophe},
  booktitle    = {Atomic layer deposition in energy conversion applications},
  editor       = {Bachmann, Julien},
  isbn         = {9783527339129},
  language     = {eng},
  pages        = {3--40},
  publisher    = {Wiley-VCH},
  title        = {Basics of atomic layer deposition : growth characteristics and conformality},
  url          = {http://dx.doi.org/10.1002/9783527694822.ch1},
  year         = {2017},
}

Chicago
Dendooven, Jolien, and Christophe Detavernier. 2017. “Basics of Atomic Layer Deposition : Growth Characteristics and Conformality.” In Atomic Layer Deposition in Energy Conversion Applications, ed. Julien Bachmann, 3–40. Weinheim, Germany: Wiley-VCH.
APA
Dendooven, J., & Detavernier, C. (2017). Basics of atomic layer deposition : growth characteristics and conformality. In J. Bachmann (Ed.), Atomic layer deposition in energy conversion applications (pp. 3–40). Weinheim, Germany: Wiley-VCH.
Vancouver
1.
Dendooven J, Detavernier C. Basics of atomic layer deposition : growth characteristics and conformality. In: Bachmann J, editor. Atomic layer deposition in energy conversion applications. Weinheim, Germany: Wiley-VCH; 2017. p. 3–40.
MLA
Dendooven, Jolien, and Christophe Detavernier. “Basics of Atomic Layer Deposition : Growth Characteristics and Conformality.” Atomic Layer Deposition in Energy Conversion Applications. Ed. Julien Bachmann. Weinheim, Germany: Wiley-VCH, 2017. 3–40. Print.