Advanced search
1 file | 1.50 MB

Basics of atomic layer deposition : growth characteristics and conformality

Author
Organization

Downloads

  • (...).pdf
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 1.50 MB

Citation

Please use this url to cite or link to this publication:

Chicago
Dendooven, Jolien, and Christophe Detavernier. 2017. “Basics of Atomic Layer Deposition : Growth Characteristics and Conformality.” In Atomic Layer Deposition in Energy Conversion Applications, ed. Julien Bachmann, 3–40. Weinheim, Germany: Wiley-VCH.
APA
Dendooven, J., & Detavernier, C. (2017). Basics of atomic layer deposition : growth characteristics and conformality. In J. Bachmann (Ed.), Atomic layer deposition in energy conversion applications (pp. 3–40). Weinheim, Germany: Wiley-VCH.
Vancouver
1.
Dendooven J, Detavernier C. Basics of atomic layer deposition : growth characteristics and conformality. In: Bachmann J, editor. Atomic layer deposition in energy conversion applications. Weinheim, Germany: Wiley-VCH; 2017. p. 3–40.
MLA
Dendooven, Jolien, and Christophe Detavernier. “Basics of Atomic Layer Deposition : Growth Characteristics and Conformality.” Atomic Layer Deposition in Energy Conversion Applications. Ed. Julien Bachmann. Weinheim, Germany: Wiley-VCH, 2017. 3–40. Print.
@incollection{8536186,
  author       = {Dendooven, Jolien and Detavernier, Christophe},
  booktitle    = {Atomic layer deposition in energy conversion applications},
  editor       = {Bachmann, Julien},
  isbn         = {9783527339129},
  language     = {eng},
  pages        = {3--40},
  publisher    = {Wiley-VCH},
  title        = {Basics of atomic layer deposition : growth characteristics and conformality},
  url          = {http://dx.doi.org/10.1002/9783527694822.ch1},
  year         = {2017},
}

Altmetric
View in Altmetric