The target material influence on the current pulse during high power pulsed magnetron sputtering
- Author
- Filip Moens, Stéphanos Konstantinidis and Diederik Depla (UGent)
- Organization
- Abstract
- The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials. Based on physical processes such as gas rarefaction, ion-induced electron emission, and electron impact ionization, two test parameters were derived that significantly correlate with specific features of the current-time characteristic: (i) the peak current is correlated to the momentum transfer between the sputtered material and the argon gas, (ii) while the observed current plateau after the peak is connected to the metal ionization rate.
- Keywords
- HPPMS, gas rarefaction, electron emission, target material, waveform analysis, ELECTRON-IMPACT IONIZATION, PHYSICAL VAPOR-DEPOSITION, CROSS-SECTIONS, FILMS, THIN, MOLECULES, FORMALISM, DISCHARGE, SURFACES, COPPER
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-8534675
- MLA
- Moens, Filip, et al. “The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering.” FRONTIERS IN PHYSICS, vol. 5, 2017, doi:10.3389/fphy.2017.00051.
- APA
- Moens, F., Konstantinidis, S., & Depla, D. (2017). The target material influence on the current pulse during high power pulsed magnetron sputtering. FRONTIERS IN PHYSICS, 5. https://doi.org/10.3389/fphy.2017.00051
- Chicago author-date
- Moens, Filip, Stéphanos Konstantinidis, and Diederik Depla. 2017. “The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering.” FRONTIERS IN PHYSICS 5. https://doi.org/10.3389/fphy.2017.00051.
- Chicago author-date (all authors)
- Moens, Filip, Stéphanos Konstantinidis, and Diederik Depla. 2017. “The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering.” FRONTIERS IN PHYSICS 5. doi:10.3389/fphy.2017.00051.
- Vancouver
- 1.Moens F, Konstantinidis S, Depla D. The target material influence on the current pulse during high power pulsed magnetron sputtering. FRONTIERS IN PHYSICS. 2017;5.
- IEEE
- [1]F. Moens, S. Konstantinidis, and D. Depla, “The target material influence on the current pulse during high power pulsed magnetron sputtering,” FRONTIERS IN PHYSICS, vol. 5, 2017.
@article{8534675,
abstract = {{The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials. Based on physical processes such as gas rarefaction, ion-induced electron emission, and electron impact ionization, two test parameters were derived that significantly correlate with specific features of the current-time characteristic: (i) the peak current is correlated to the momentum transfer between the sputtered material and the argon gas, (ii) while the observed current plateau after the peak is connected to the metal ionization rate.}},
articleno = {{51}},
author = {{Moens, Filip and Konstantinidis, Stéphanos and Depla, Diederik}},
issn = {{2296-424X}},
journal = {{FRONTIERS IN PHYSICS}},
keywords = {{HPPMS,gas rarefaction,electron emission,target material,waveform analysis,ELECTRON-IMPACT IONIZATION,PHYSICAL VAPOR-DEPOSITION,CROSS-SECTIONS,FILMS,THIN,MOLECULES,FORMALISM,DISCHARGE,SURFACES,COPPER}},
language = {{eng}},
pages = {{8}},
title = {{The target material influence on the current pulse during high power pulsed magnetron sputtering}},
url = {{http://doi.org/10.3389/fphy.2017.00051}},
volume = {{5}},
year = {{2017}},
}
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