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Atomic layer deposition-enabled single layer of tungsten trioxide across a large area

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OXIDE FILMS, ELECTRICAL-PROPERTIES, RAMAN-SPECTROSCOPY, METAL-OXIDES, WO3, DEVICES, SENSOR, WATER, PHOTODETECTOR, PRECURSORS, WO3, Monolayer, Atomic layer deposition (ALD), Two-dimensional, semiconductors

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Chicago
Zhuiykov, Serge, Lachlan Hyde, Zhenyin Hai, Mohammad Karbalaeiakbari, Eugene Kats, Christophe Detavernier, Chenyang Xue, and Hongyan Xu. 2017. “Atomic Layer Deposition-enabled Single Layer of Tungsten Trioxide Across a Large Area.” Applied Materials Today 6: 44–53.
APA
Zhuiykov, Serge, Hyde, L., Hai, Z., Karbalaeiakbari, M., Kats, E., Detavernier, C., Xue, C., et al. (2017). Atomic layer deposition-enabled single layer of tungsten trioxide across a large area. APPLIED MATERIALS TODAY, 6, 44–53.
Vancouver
1.
Zhuiykov S, Hyde L, Hai Z, Karbalaeiakbari M, Kats E, Detavernier C, et al. Atomic layer deposition-enabled single layer of tungsten trioxide across a large area. APPLIED MATERIALS TODAY. 2017;6:44–53.
MLA
Zhuiykov, Serge et al. “Atomic Layer Deposition-enabled Single Layer of Tungsten Trioxide Across a Large Area.” APPLIED MATERIALS TODAY 6 (2017): 44–53. Print.
@article{8531371,
  author       = {Zhuiykov, Serge and Hyde, Lachlan and Hai, Zhenyin and Karbalaeiakbari, Mohammad and Kats, Eugene and Detavernier, Christophe and Xue, Chenyang and Xu, Hongyan},
  issn         = {2352-9407},
  journal      = {APPLIED MATERIALS TODAY},
  language     = {eng},
  pages        = {44--53},
  title        = {Atomic layer deposition-enabled single layer of tungsten trioxide across a large area},
  url          = {http://dx.doi.org/10.1016/j.apmt.2016.12.004},
  volume       = {6},
  year         = {2017},
}

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