Advanced search
Add to list

IMPROVEMENT OF FOCUS AND EXPOSURE LATITUDE BY THE USE OF PHASE-SHIFTING MASKS FOR DUV APPLICATIONS

Author
Organization

Citation

Please use this url to cite or link to this publication:

MLA
Op de Beeck, Maaike et al. “Improvement of Focus and Exposure Latitude by the Use of Phase-shifting Masks for Duv Applications.” Optical/laser Microlithography Iv. Vol. 1463. Bellingham: Spie - Int Soc Optical Engineering, 1991. 180–196. Print.
APA
Op de Beeck, Maaike, TOKUI, A., FUJINAGA, M., YOSHIOKA, N., KAMON, K., HANAWA, T., & TSUKAMOTO, K. (1991). IMPROVEMENT OF FOCUS AND EXPOSURE LATITUDE BY THE USE OF PHASE-SHIFTING MASKS FOR DUV APPLICATIONS. OPTICAL/LASER MICROLITHOGRAPHY IV (Vol. 1463, pp. 180–196). Presented at the CONF ON OPTICAL/LASER MICROLITHOGRAPHY 4, Bellingham: Spie - Int Soc Optical Engineering.
Chicago author-date
Op de Beeck, Maaike, A TOKUI, M FUJINAGA, N YOSHIOKA, K KAMON, T HANAWA, and K TSUKAMOTO. 1991. “Improvement of Focus and Exposure Latitude by the Use of Phase-shifting Masks for Duv Applications.” In Optical/laser Microlithography Iv, 1463:180–196. Bellingham: Spie - Int Soc Optical Engineering.
Chicago author-date (all authors)
Op de Beeck, Maaike, A TOKUI, M FUJINAGA, N YOSHIOKA, K KAMON, T HANAWA, and K TSUKAMOTO. 1991. “Improvement of Focus and Exposure Latitude by the Use of Phase-shifting Masks for Duv Applications.” In Optical/laser Microlithography Iv, 1463:180–196. Bellingham: Spie - Int Soc Optical Engineering.
Vancouver
1.
Op de Beeck M, TOKUI A, FUJINAGA M, YOSHIOKA N, KAMON K, HANAWA T, et al. IMPROVEMENT OF FOCUS AND EXPOSURE LATITUDE BY THE USE OF PHASE-SHIFTING MASKS FOR DUV APPLICATIONS. OPTICAL/LASER MICROLITHOGRAPHY IV. Bellingham: Spie - Int Soc Optical Engineering; 1991. p. 180–96.
IEEE
[1]
M. Op de Beeck et al., “IMPROVEMENT OF FOCUS AND EXPOSURE LATITUDE BY THE USE OF PHASE-SHIFTING MASKS FOR DUV APPLICATIONS,” in OPTICAL/LASER MICROLITHOGRAPHY IV, SAN JOSE, CA, 1991, vol. 1463, pp. 180–196.
@inproceedings{8530750,
  author       = {Op de Beeck, Maaike and TOKUI, A and FUJINAGA, M and YOSHIOKA, N and KAMON, K and HANAWA, T and TSUKAMOTO, K},
  booktitle    = {OPTICAL/LASER MICROLITHOGRAPHY IV},
  isbn         = {0-8194-0562-0},
  language     = {eng},
  location     = {SAN JOSE, CA},
  pages        = {180--196},
  publisher    = {Spie - Int Soc Optical Engineering},
  title        = {IMPROVEMENT OF FOCUS AND EXPOSURE LATITUDE BY THE USE OF PHASE-SHIFTING MASKS FOR DUV APPLICATIONS},
  volume       = {1463},
  year         = {1991},
}