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Combined illumination sources for hyper-NA contact hole printing

(2007) SOLID STATE TECHNOLOGY. 50(11). p.48-50
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Organization
Abstract
Patterning of contact layers with minimal half pitch below 90nm has proven to be a very difficult task. in general, difficulties in contact patterning are driven by the low depth-of-focus (DoF) toward isolated contacts and/or the higher mask error enhancement factor (MEEF) for denser contact arrays. As for the illumination source shape, the traditional choice is between conventional illumination and off-axis illumination (OAI). Recent results obtained at IMEC on immersion scanners at 1.2 and 1.35 numerical aperture (NA), however, show that combined illumination sources, called Soft Annular and Soft QUASAR, are advantageous for through-pitch contact printing, in terms of MEEF and process latitude, without the use of assist features.

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Chicago
Bekaert, J., V. Truffert, P. Willems, L. Van Look, Maaike Op de Beeck, E. Hendrich, and G. Vandenberghe. 2007. “Combined Illumination Sources for hyper-NA Contact Hole Printing.” Solid State Technology 50 (11): 48–50.
APA
Bekaert, J., Truffert, V., Willems, P., Van Look, L., Op de Beeck, M., Hendrich, E., & Vandenberghe, G. (2007). Combined illumination sources for hyper-NA contact hole printing. SOLID STATE TECHNOLOGY, 50(11), 48–50.
Vancouver
1.
Bekaert J, Truffert V, Willems P, Van Look L, Op de Beeck M, Hendrich E, et al. Combined illumination sources for hyper-NA contact hole printing. SOLID STATE TECHNOLOGY. Northbrook: Pennwell Publ Co; 2007;50(11):48–50.
MLA
Bekaert, J., V. Truffert, P. Willems, et al. “Combined Illumination Sources for hyper-NA Contact Hole Printing.” SOLID STATE TECHNOLOGY 50.11 (2007): 48–50. Print.
@article{8530640,
  abstract     = {Patterning of contact layers with minimal half pitch below 90nm has proven to be a very difficult task. in general, difficulties in contact patterning are driven by the low depth-of-focus (DoF) toward isolated contacts and/or the higher mask error enhancement factor (MEEF) for denser contact arrays. As for the illumination source shape, the traditional choice is between conventional illumination and off-axis illumination (OAI). Recent results obtained at IMEC on immersion scanners at 1.2 and 1.35 numerical aperture (NA), however, show that combined illumination sources, called Soft Annular and Soft QUASAR, are advantageous for through-pitch contact printing, in terms of MEEF and process latitude, without the use of assist features.},
  author       = {Bekaert, J. and Truffert, V. and Willems, P. and Van Look, L. and Op de Beeck, Maaike and Hendrich, E. and Vandenberghe, G.},
  issn         = {0038-111X},
  journal      = {SOLID STATE TECHNOLOGY},
  language     = {eng},
  number       = {11},
  pages        = {48--50},
  publisher    = {Pennwell Publ Co},
  title        = {Combined illumination sources for hyper-NA contact hole printing},
  volume       = {50},
  year         = {2007},
}

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