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The effect of the substrate characteristics on the electrochemical nucleation and growth of copper

(2016) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 163(12). p.D3053-D3061
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Keywords
UNDERPOTENTIAL DEPOSITION, BARRIER LAYERS, TOF-SIMS, ELECTRODEPOSITION, CU, SURFACES, AU, AG

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Citation

Please use this url to cite or link to this publication:

MLA
Nagar, Magi et al. “The Effect of the Substrate Characteristics on the Electrochemical Nucleation and Growth of Copper.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 163.12 (2016): D3053–D3061. Print.
APA
Nagar, M., Radisic, A., Strubbe, K., & Vereecken, P. M. (2016). The effect of the substrate characteristics on the electrochemical nucleation and growth of copper. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 163(12), D3053–D3061.
Chicago author-date
Nagar, Magi, Aleksandar Radisic, Katrien Strubbe, and Philippe M Vereecken. 2016. “The Effect of the Substrate Characteristics on the Electrochemical Nucleation and Growth of Copper.” Journal of the Electrochemical Society 163 (12): D3053–D3061.
Chicago author-date (all authors)
Nagar, Magi, Aleksandar Radisic, Katrien Strubbe, and Philippe M Vereecken. 2016. “The Effect of the Substrate Characteristics on the Electrochemical Nucleation and Growth of Copper.” Journal of the Electrochemical Society 163 (12): D3053–D3061.
Vancouver
1.
Nagar M, Radisic A, Strubbe K, Vereecken PM. The effect of the substrate characteristics on the electrochemical nucleation and growth of copper. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 2016;163(12):D3053–D3061.
IEEE
[1]
M. Nagar, A. Radisic, K. Strubbe, and P. M. Vereecken, “The effect of the substrate characteristics on the electrochemical nucleation and growth of copper,” JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 163, no. 12, pp. D3053–D3061, 2016.
@article{8521477,
  author       = {Nagar, Magi and Radisic, Aleksandar and Strubbe, Katrien and Vereecken, Philippe M},
  issn         = {0013-4651},
  journal      = {JOURNAL OF THE ELECTROCHEMICAL SOCIETY},
  keywords     = {UNDERPOTENTIAL DEPOSITION,BARRIER LAYERS,TOF-SIMS,ELECTRODEPOSITION,CU,SURFACES,AU,AG},
  language     = {eng},
  number       = {12},
  pages        = {D3053--D3061},
  title        = {The effect of the substrate characteristics on the electrochemical nucleation and growth of copper},
  url          = {http://dx.doi.org/10.1149/2.0081612jes},
  volume       = {163},
  year         = {2016},
}

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