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Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Koen Strijckmans UGent, Filip Moens UGent and Diederik Depla UGent (2017) JOURNAL OF APPLIED PHYSICS. 121(8).
abstract
This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated. From this first study, it becomes clear that the probability to observe hysteresis is much lower as compared to DC magnetron sputtering. The high current pulses cannot explain the hysteresis reduction. Total pressure and material choice make the abrupt changes less pronounced, but the implantation of ionized metal atoms that return to the target seems to be the major cause. To further substantiate these results, the analytical reactive sputtering model is coupled with a published global plasma model. The effect of metal ion implantation is confirmed. Another suggested mechanism, i.e., gas rarefaction, can be ruled out to explain the hysteresis reduction. But perhaps the major conclusion is that at present, there are too little experimental data available to make fully sound conclusions.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
LOW-FREQUENCY MODULATION, DEPOSITION RATE, DISCHARGE CURRENT, PULSED DC, OXYGEN, FILMS, AL(111), ALUMINUM, BEHAVIOR, MODEL
journal title
JOURNAL OF APPLIED PHYSICS
J. Appl. Phys.
volume
121
issue
8
article number
080901
pages
12 pages
Web of Science type
Article
Web of Science id
000395289400001
ISSN
0021-8979
DOI
10.1063/1.4976717
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
8514303
handle
http://hdl.handle.net/1854/LU-8514303
date created
2017-03-14 11:17:03
date last changed
2017-05-29 13:05:34
@article{8514303,
  abstract     = {This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated. From this first study, it becomes clear that the probability to observe hysteresis is much lower as compared to DC magnetron sputtering. The high current pulses cannot explain the hysteresis reduction. Total pressure and material choice make the abrupt changes less pronounced, but the implantation of ionized metal atoms that return to the target seems to be the major cause. To further substantiate these results, the analytical reactive sputtering model is coupled with a published global plasma model. The effect of metal ion implantation is confirmed. Another suggested mechanism, i.e., gas rarefaction, can be ruled out to explain the hysteresis reduction. But perhaps the major conclusion is that at present, there are too little experimental data available to make fully sound conclusions.},
  articleno    = { 080901},
  author       = {Strijckmans, Koen and Moens, Filip and Depla, Diederik},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  keyword      = {LOW-FREQUENCY MODULATION,DEPOSITION RATE,DISCHARGE CURRENT,PULSED DC,OXYGEN,FILMS,AL(111),ALUMINUM,BEHAVIOR,MODEL},
  language     = {eng},
  number       = {8},
  pages        = {12},
  title        = {Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?},
  url          = {http://dx.doi.org/10.1063/1.4976717},
  volume       = {121},
  year         = {2017},
}

Chicago
Strijckmans, Koen, Filip Moens, and Diederik Depla. 2017. “Perspective: Is There a Hysteresis During Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?” Journal of Applied Physics 121 (8).
APA
Strijckmans, Koen, Moens, F., & Depla, D. (2017). Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)? JOURNAL OF APPLIED PHYSICS, 121(8).
Vancouver
1.
Strijckmans K, Moens F, Depla D. Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)? JOURNAL OF APPLIED PHYSICS. 2017;121(8).
MLA
Strijckmans, Koen, Filip Moens, and Diederik Depla. “Perspective: Is There a Hysteresis During Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?” JOURNAL OF APPLIED PHYSICS 121.8 (2017): n. pag. Print.