Ghent University Academic Bibliography

Advanced

Texture in thin film silicides and germanides : a review

Bob De Schutter UGent, Koen De Keyser UGent, C Lavoie and Christophe Detavernier UGent (2016) APPLIED PHYSICS REVIEWS. 3(3).
abstract
Silicides and germanides are compounds consisting of a metal and silicon or germanium. In the microelectronics industry, silicides are the material of choice for contacting silicon based devices (over the years, CoSi2, C54-TiSi2, and NiSi have been adopted), while germanides are considered as a top candidate for contacting future germanium based electronics. Since also strain engineering through the use of Si1-xGex in the source/drain/gate regions of MOSFET devices is an important technique for improving device characteristics in modern Si-based microelectronics industry, a profound understanding of the formation of silicide/germanide contacts to silicon and germanium is of utmost importance. The crystallographic texture of these films, which is defined as the statistical distribution of the orientation of the grains in the film, has been the subject of scientific studies since the 1970s. Different types of texture like epitaxy, axiotaxy, fiber, or combinations thereof have been observed in such films. In recent years, it has become increasingly clear that film texture can have a profound influence on the formation and stability of silicide/germanide contacts, as it controls the type and orientation of grain boundaries (affecting diffusion and agglomeration) and the interface energy (affecting nucleation during the solid-state reaction). Furthermore, the texture also has an impact on the electrical characteristics of the contact, as the orientation and size of individual grains influences functional properties such as contact resistance and sheet resistance and will induce local variations in strain and Schottky barrier height. This review aims to give a comprehensive overview of the scientific work that has been published in the field of texture studies on thin film silicide/germanide contacts. Published by AIP Publishing.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (review)
publication status
published
subject
keyword
ELECTRON-EMISSION-MICROSCOPY, SCHOTTKY-BARRIER HEIGHT, METAL-SEMICONDUCTOR INTERFACES, PARTIAL EPITAXIAL-GROWTH, RARE-EARTH, SILICIDES, SOLID-STATE REACTION, PHASE-FORMATION, NICKEL-SILICIDE, COSI2, FILMS, POLYCRYSTALLINE SILICON
journal title
APPLIED PHYSICS REVIEWS
Appl. Phys. Rev.
volume
3
issue
3
article number
031302
pages
34 pages
Web of Science type
Review
Web of Science id
000386906200008
JCR category
PHYSICS, APPLIED
JCR impact factor
13.667 (2016)
JCR rank
6/147 (2016)
JCR quartile
1 (2016)
ISSN
1931-9401
DOI
10.1063/1.4960122
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
8510076
handle
http://hdl.handle.net/1854/LU-8510076
date created
2017-02-17 16:32:19
date last changed
2017-10-02 22:30:29
@article{8510076,
  abstract     = {Silicides and germanides are compounds consisting of a metal and silicon or germanium. In the microelectronics industry, silicides are the material of choice for contacting silicon based devices (over the years, CoSi2, C54-TiSi2, and NiSi have been adopted), while germanides are considered as a top candidate for contacting future germanium based electronics. Since also strain engineering through the use of Si1-xGex in the source/drain/gate regions of MOSFET devices is an important technique for improving device characteristics in modern Si-based microelectronics industry, a profound understanding of the formation of silicide/germanide contacts to silicon and germanium is of utmost importance. The crystallographic texture of these films, which is defined as the statistical distribution of the orientation of the grains in the film, has been the subject of scientific studies since the 1970s. Different types of texture like epitaxy, axiotaxy, fiber, or combinations thereof have been observed in such films. In recent years, it has become increasingly clear that film texture can have a profound influence on the formation and stability of silicide/germanide contacts, as it controls the type and orientation of grain boundaries (affecting diffusion and agglomeration) and the interface energy (affecting nucleation during the solid-state reaction). Furthermore, the texture also has an impact on the electrical characteristics of the contact, as the orientation and size of individual grains influences functional properties such as contact resistance and sheet resistance and will induce local variations in strain and Schottky barrier height. This review aims to give a comprehensive overview of the scientific work that has been published in the field of texture studies on thin film silicide/germanide contacts. Published by AIP Publishing.},
  articleno    = {031302},
  author       = {De Schutter, Bob and De Keyser, Koen and Lavoie, C and Detavernier, Christophe},
  issn         = {1931-9401},
  journal      = {APPLIED PHYSICS REVIEWS},
  keyword      = {ELECTRON-EMISSION-MICROSCOPY,SCHOTTKY-BARRIER HEIGHT,METAL-SEMICONDUCTOR INTERFACES,PARTIAL EPITAXIAL-GROWTH,RARE-EARTH,SILICIDES,SOLID-STATE REACTION,PHASE-FORMATION,NICKEL-SILICIDE,COSI2,FILMS,POLYCRYSTALLINE SILICON},
  language     = {eng},
  number       = {3},
  pages        = {34},
  title        = {Texture in thin film silicides and germanides : a review},
  url          = {http://dx.doi.org/10.1063/1.4960122},
  volume       = {3},
  year         = {2016},
}

Chicago
De Schutter, Bob, Koen De Keyser, C Lavoie, and Christophe Detavernier. 2016. “Texture in Thin Film Silicides and Germanides : a Review.” Applied Physics Reviews 3 (3).
APA
De Schutter, B., De Keyser, K., Lavoie, C., & Detavernier, C. (2016). Texture in thin film silicides and germanides : a review. APPLIED PHYSICS REVIEWS, 3(3).
Vancouver
1.
De Schutter B, De Keyser K, Lavoie C, Detavernier C. Texture in thin film silicides and germanides : a review. APPLIED PHYSICS REVIEWS. 2016;3(3).
MLA
De Schutter, Bob, Koen De Keyser, C Lavoie, et al. “Texture in Thin Film Silicides and Germanides : a Review.” APPLIED PHYSICS REVIEWS 3.3 (2016): n. pag. Print.