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Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries

Thomas Dobbelaere UGent, Felix Mattelaer UGent, Amit Kumar Roy, Philippe Vereecken and Christophe Detavernier UGent (2017) JOURNAL OF MATERIALS CHEMISTRY A. 5(1). p.330-338
abstract
Titanium phosphate thin films were deposited by a new plasma-enhanced atomic layer deposition process. The process consisted of sequential exposures to trimethyl phosphate (TMP, Me3PO4) plasma, O-2 plasma and titanium isopropoxide (TTIP, Ti(OCH(CH3)(2))(4)) vapor, and it was characterized by in situ spectroscopic ellipsometry and ex situ X-ray reflectometry. The growth linearity, growth per cycle (GPC), and density of the resulting thin films were investigated as a function of the pulse times and the substrate temperature. The conformality of the process was characterized by deposition on micropillars. At a substrate temperature of 300 degrees C and using saturated pulse times, linear growth with a GPC of 0.66 nm per cycle and without nucleation delay was achieved. The as-deposited films were amorphous, while crystalline TiP2O7 was formed upon annealing in air or helium atmospheres. In lithium-ion test cells, the as-deposited films showed insertion and extraction of Li+ around a potential of 2.7 V vs. Li/Li+. Charge/discharge measurements revealed a volumetric capacity of 330 mA h cm(-3), together with a good rate capability and minimal capacity fading.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
OXIDE THIN-FILMS, ALUMINUM PHOSPHATE, GROWTH-KINETICS, TETRAISOPROPOXIDE, CRYSTALLIZATION, CATHODE, SILICON, TIP2O7, TIO2
journal title
JOURNAL OF MATERIALS CHEMISTRY A
J. Mater. Chem. A
volume
5
issue
1
pages
330 - 338
Web of Science type
Article
Web of Science id
000391572200035
ISSN
2050-7488
DOI
10.1039/c6ta04179e
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
8510064
handle
http://hdl.handle.net/1854/LU-8510064
date created
2017-02-17 16:21:07
date last changed
2017-05-29 13:33:06
@article{8510064,
  abstract     = {Titanium phosphate thin films were deposited by a new plasma-enhanced atomic layer deposition process. The process consisted of sequential exposures to trimethyl phosphate (TMP, Me3PO4) plasma, O-2 plasma and titanium isopropoxide (TTIP, Ti(OCH(CH3)(2))(4)) vapor, and it was characterized by in situ spectroscopic ellipsometry and ex situ X-ray reflectometry. The growth linearity, growth per cycle (GPC), and density of the resulting thin films were investigated as a function of the pulse times and the substrate temperature. The conformality of the process was characterized by deposition on micropillars. At a substrate temperature of 300 degrees C and using saturated pulse times, linear growth with a GPC of 0.66 nm per cycle and without nucleation delay was achieved. The as-deposited films were amorphous, while crystalline TiP2O7 was formed upon annealing in air or helium atmospheres. In lithium-ion test cells, the as-deposited films showed insertion and extraction of Li+ around a potential of 2.7 V vs. Li/Li+. Charge/discharge measurements revealed a volumetric capacity of 330 mA h cm(-3), together with a good rate capability and minimal capacity fading.},
  author       = {Dobbelaere, Thomas and Mattelaer, Felix and Roy, Amit Kumar and Vereecken, Philippe and Detavernier, Christophe},
  issn         = {2050-7488},
  journal      = {JOURNAL OF MATERIALS CHEMISTRY A},
  keyword      = {OXIDE THIN-FILMS,ALUMINUM PHOSPHATE,GROWTH-KINETICS,TETRAISOPROPOXIDE,CRYSTALLIZATION,CATHODE,SILICON,TIP2O7,TIO2},
  language     = {eng},
  number       = {1},
  pages        = {330--338},
  title        = {Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries},
  url          = {http://dx.doi.org/10.1039/c6ta04179e},
  volume       = {5},
  year         = {2017},
}

Chicago
Dobbelaere, Thomas, Felix Mattelaer, Amit Kumar Roy, Philippe Vereecken, and Christophe Detavernier. 2017. “Plasma-enhanced Atomic Layer Deposition of Titanium Phosphate as an Electrode for Lithium-ion Batteries.” Journal of Materials Chemistry A 5 (1): 330–338.
APA
Dobbelaere, T., Mattelaer, F., Roy, A. K., Vereecken, P., & Detavernier, C. (2017). Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries. JOURNAL OF MATERIALS CHEMISTRY A, 5(1), 330–338.
Vancouver
1.
Dobbelaere T, Mattelaer F, Roy AK, Vereecken P, Detavernier C. Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries. JOURNAL OF MATERIALS CHEMISTRY A. 2017;5(1):330–8.
MLA
Dobbelaere, Thomas, Felix Mattelaer, Amit Kumar Roy, et al. “Plasma-enhanced Atomic Layer Deposition of Titanium Phosphate as an Electrode for Lithium-ion Batteries.” JOURNAL OF MATERIALS CHEMISTRY A 5.1 (2017): 330–338. Print.