Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures
- Author
- Véronique Cremers (UGent) , Filip Geenen (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)
- Organization
- Keywords
- ASPECT-RATIO NANOPORES, CARBON NANOTUBES, STEP COVERAGE, CONFORMALITY, OPTIMIZATION, AL2O3, MODEL, METHODOLOGY, TRANSPORT, TRENCHES
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-8200780
- MLA
- Cremers, Véronique, et al. “Monte Carlo Simulations of Atomic Layer Deposition on 3D Large Surface Area Structures : Required Precursor Exposure for Pillar- versus Hole-Type Structures.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, vol. 35, no. 1, 2017, doi:10.1116/1.4968201.
- APA
- Cremers, V., Geenen, F., Detavernier, C., & Dendooven, J. (2017). Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 35(1). https://doi.org/10.1116/1.4968201
- Chicago author-date
- Cremers, Véronique, Filip Geenen, Christophe Detavernier, and Jolien Dendooven. 2017. “Monte Carlo Simulations of Atomic Layer Deposition on 3D Large Surface Area Structures : Required Precursor Exposure for Pillar- versus Hole-Type Structures.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 35 (1). https://doi.org/10.1116/1.4968201.
- Chicago author-date (all authors)
- Cremers, Véronique, Filip Geenen, Christophe Detavernier, and Jolien Dendooven. 2017. “Monte Carlo Simulations of Atomic Layer Deposition on 3D Large Surface Area Structures : Required Precursor Exposure for Pillar- versus Hole-Type Structures.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 35 (1). doi:10.1116/1.4968201.
- Vancouver
- 1.Cremers V, Geenen F, Detavernier C, Dendooven J. Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2017;35(1).
- IEEE
- [1]V. Cremers, F. Geenen, C. Detavernier, and J. Dendooven, “Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures,” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, vol. 35, no. 1, 2017.
@article{8200780, articleno = {{01B115}}, author = {{Cremers, Véronique and Geenen, Filip and Detavernier, Christophe and Dendooven, Jolien}}, issn = {{0734-2101}}, journal = {{JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A}}, keywords = {{ASPECT-RATIO NANOPORES,CARBON NANOTUBES,STEP COVERAGE,CONFORMALITY,OPTIMIZATION,AL2O3,MODEL,METHODOLOGY,TRANSPORT,TRENCHES}}, language = {{eng}}, number = {{1}}, pages = {{6}}, title = {{Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures}}, url = {{http://doi.org/10.1116/1.4968201}}, volume = {{35}}, year = {{2017}}, }
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