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Influence of the magnetic field configuration on the reactive sputter deposition of TiN

Francis Boydens (UGent) , Stijn Mahieu (UGent) , Johan Haemers (UGent) and Diederik Depla (UGent)
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Keywords
PREFERRED ORIENTATION, TITANIUM NITRIDE FILMS, INCIDENT, GROWTH, MICROSTRUCTURE, SUBSTRATE

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Citation

Please use this url to cite or link to this publication:

Chicago
Boydens, Francis, Stijn Mahieu, Johan Haemers, and Diederik Depla. 2010. “Influence of the Magnetic Field Configuration on the Reactive Sputter Deposition of TiN.” Physica Status Solidi A-applications and Materials Science 207 (1): 124–128.
APA
Boydens, F., Mahieu, S., Haemers, J., & Depla, D. (2010). Influence of the magnetic field configuration on the reactive sputter deposition of TiN. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 207(1), 124–128.
Vancouver
1.
Boydens F, Mahieu S, Haemers J, Depla D. Influence of the magnetic field configuration on the reactive sputter deposition of TiN. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. 2010;207(1):124–8.
MLA
Boydens, Francis, Stijn Mahieu, Johan Haemers, et al. “Influence of the Magnetic Field Configuration on the Reactive Sputter Deposition of TiN.” PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 207.1 (2010): 124–128. Print.
@article{817164,
  author       = {Boydens, Francis and Mahieu, Stijn and Haemers, Johan and Depla, Diederik},
  issn         = {1862-6300},
  journal      = {PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE},
  language     = {eng},
  number       = {1},
  pages        = {124--128},
  title        = {Influence of the magnetic field configuration on the reactive sputter deposition of TiN},
  url          = {http://dx.doi.org/10.1002/pssa.200925203},
  volume       = {207},
  year         = {2010},
}

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