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Influence of the magnetic field configuration on the reactive sputter deposition of TiN

Francis Boydens (UGent) , Stijn Mahieu (UGent) , Johan Haemers (UGent) and Diederik Depla (UGent)
Author
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Keywords
PREFERRED ORIENTATION, TITANIUM NITRIDE FILMS, INCIDENT, GROWTH, MICROSTRUCTURE, SUBSTRATE

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Citation

Please use this url to cite or link to this publication:

MLA
Boydens, Francis et al. “Influence of the Magnetic Field Configuration on the Reactive Sputter Deposition of TiN.” PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 207.1 (2010): 124–128. Print.
APA
Boydens, F., Mahieu, S., Haemers, J., & Depla, D. (2010). Influence of the magnetic field configuration on the reactive sputter deposition of TiN. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 207(1), 124–128.
Chicago author-date
Boydens, Francis, Stijn Mahieu, Johan Haemers, and Diederik Depla. 2010. “Influence of the Magnetic Field Configuration on the Reactive Sputter Deposition of TiN.” Physica Status Solidi A-applications and Materials Science 207 (1): 124–128.
Chicago author-date (all authors)
Boydens, Francis, Stijn Mahieu, Johan Haemers, and Diederik Depla. 2010. “Influence of the Magnetic Field Configuration on the Reactive Sputter Deposition of TiN.” Physica Status Solidi A-applications and Materials Science 207 (1): 124–128.
Vancouver
1.
Boydens F, Mahieu S, Haemers J, Depla D. Influence of the magnetic field configuration on the reactive sputter deposition of TiN. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. 2010;207(1):124–8.
IEEE
[1]
F. Boydens, S. Mahieu, J. Haemers, and D. Depla, “Influence of the magnetic field configuration on the reactive sputter deposition of TiN,” PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol. 207, no. 1, pp. 124–128, 2010.
@article{817164,
  author       = {Boydens, Francis and Mahieu, Stijn and Haemers, Johan and Depla, Diederik},
  issn         = {1862-6300},
  journal      = {PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE},
  keywords     = {PREFERRED ORIENTATION,TITANIUM NITRIDE FILMS,INCIDENT,GROWTH,MICROSTRUCTURE,SUBSTRATE},
  language     = {eng},
  number       = {1},
  pages        = {124--128},
  title        = {Influence of the magnetic field configuration on the reactive sputter deposition of TiN},
  url          = {http://dx.doi.org/10.1002/pssa.200925203},
  volume       = {207},
  year         = {2010},
}

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