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Design requirements for group-IV laser based on fully strained Ge1-xSnx embedded in partially relaxed Si1-y-zGeySnz buffer layers

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Center for nano- and biophotonics (NB-Photonics)
Abstract
Theoretical calculation using the model solid theory is performed to design the stack of a group-IV laser based on a fully strained Ge1-xSnx active layer grown on a strain relaxed Si1-y-zGeySnz buffer/barrier layer. The degree of strain relaxation is taken into account for the calculation for the first time. The transition between the indirect and the direct band material for the active Ge1-xSnx layer is calculated as function of Sn content and strain. The required Sn content in the buffer layer needed to apply the required strain in the active layer in order to obtain a direct bandgap material is calculated. Besides, the band offset between the (partly) strain relaxed Si1-y-zGeySnz buffer layer and the Ge1-xSnx pseudomorphically grown on it is calculated. We conclude that an 80% relaxed buffer layer needs to contain 13.8% Si and 14% Sn in order to provide sufficiently high band offsets with respect to the active Ge1-xSnx layer which contains at least 6% Sn in order to obtain a direct bandgap.
Keywords
BAND-STRUCTURE, ALLOYS, DEFORMATION POTENTIALS, GE, SI, GERMANIUM, HETEROSTRUCTURES, GROWTH, TIN

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Citation

Please use this url to cite or link to this publication:

Chicago
Shimura, Yosuke, Srinivasan Ashwyn Srinivasan, and Roger Loo. 2016. “Design Requirements for group-IV Laser Based on Fully Strained Ge1-xSnx Embedded in Partially Relaxed Si1-y-zGeySnz Buffer Layers.” Ecs Journal of Solid State Science and Technology 5 (5): Q140–Q143.
APA
Shimura, Y., Srinivasan, S. A., & Loo, R. (2016). Design requirements for group-IV laser based on fully strained Ge1-xSnx embedded in partially relaxed Si1-y-zGeySnz buffer layers. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 5(5), Q140–Q143.
Vancouver
1.
Shimura Y, Srinivasan SA, Loo R. Design requirements for group-IV laser based on fully strained Ge1-xSnx embedded in partially relaxed Si1-y-zGeySnz buffer layers. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. 2016;5(5):Q140–Q143.
MLA
Shimura, Yosuke, Srinivasan Ashwyn Srinivasan, and Roger Loo. “Design Requirements for group-IV Laser Based on Fully Strained Ge1-xSnx Embedded in Partially Relaxed Si1-y-zGeySnz Buffer Layers.” ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY 5.5 (2016): Q140–Q143. Print.
@article{8081590,
  abstract     = {Theoretical calculation using the model solid theory is performed to design the stack of a group-IV laser based on a fully strained Ge1-xSnx active layer grown on a strain relaxed Si1-y-zGeySnz buffer/barrier layer. The degree of strain relaxation is taken into account for the calculation for the first time. The transition between the indirect and the direct band material for the active Ge1-xSnx layer is calculated as function of Sn content and strain. The required Sn content in the buffer layer needed to apply the required strain in the active layer in order to obtain a direct bandgap material is calculated. Besides, the band offset between the (partly) strain relaxed Si1-y-zGeySnz buffer layer and the Ge1-xSnx pseudomorphically grown on it is calculated. We conclude that an 80% relaxed buffer layer needs to contain 13.8% Si and 14% Sn in order to provide sufficiently high band offsets with respect to the active Ge1-xSnx layer which contains at least 6% Sn in order to obtain a direct bandgap.},
  author       = {Shimura, Yosuke and Srinivasan, Srinivasan Ashwyn and Loo, Roger},
  issn         = {2162-8769},
  journal      = {ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY},
  keywords     = {BAND-STRUCTURE,ALLOYS,DEFORMATION POTENTIALS,GE,SI,GERMANIUM,HETEROSTRUCTURES,GROWTH,TIN},
  language     = {eng},
  number       = {5},
  pages        = {Q140--Q143},
  title        = {Design requirements for group-IV laser based on fully strained Ge1-xSnx embedded in partially relaxed Si1-y-zGeySnz buffer layers},
  url          = {http://dx.doi.org/10.1149/2.0301605jss},
  volume       = {5},
  year         = {2016},
}

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