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Ru thin film grown on TaN by plasma enhanced atomic layer deposition

(2009) THIN SOLID FILMS. 517(16). p.4689-4693
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Citation

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MLA
Xie, Qi et al. “Ru Thin Film Grown on TaN by Plasma Enhanced Atomic Layer Deposition.” THIN SOLID FILMS 517.16 (2009): 4689–4693. Print.
APA
Xie, Qi, Jiang, Y., Musschoot, J., Deduytsche, D., Detavernier, C., Vanmeirhaeghe, R., Van den Berghe, S., et al. (2009). Ru thin film grown on TaN by plasma enhanced atomic layer deposition. THIN SOLID FILMS, 517(16), 4689–4693.
Chicago author-date
Xie, Qi, YL Jiang, Jan Musschoot, Davy Deduytsche, Christophe Detavernier, Roland Vanmeirhaeghe, S Van den Berghe, GP Ru, BZ Li, and XP Qu. 2009. “Ru Thin Film Grown on TaN by Plasma Enhanced Atomic Layer Deposition.” Thin Solid Films 517 (16): 4689–4693.
Chicago author-date (all authors)
Xie, Qi, YL Jiang, Jan Musschoot, Davy Deduytsche, Christophe Detavernier, Roland Vanmeirhaeghe, S Van den Berghe, GP Ru, BZ Li, and XP Qu. 2009. “Ru Thin Film Grown on TaN by Plasma Enhanced Atomic Layer Deposition.” Thin Solid Films 517 (16): 4689–4693.
Vancouver
1.
Xie Q, Jiang Y, Musschoot J, Deduytsche D, Detavernier C, Vanmeirhaeghe R, et al. Ru thin film grown on TaN by plasma enhanced atomic layer deposition. THIN SOLID FILMS. 2009;517(16):4689–93.
IEEE
[1]
Q. Xie et al., “Ru thin film grown on TaN by plasma enhanced atomic layer deposition,” THIN SOLID FILMS, vol. 517, no. 16, pp. 4689–4693, 2009.
@article{783338,
  author       = {Xie, Qi and Jiang, YL and Musschoot, Jan and Deduytsche, Davy and Detavernier, Christophe and Vanmeirhaeghe, Roland and Van den Berghe, S and Ru, GP and Li, BZ and Qu, XP},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  number       = {16},
  pages        = {4689--4693},
  title        = {Ru thin film grown on TaN by plasma enhanced atomic layer deposition},
  url          = {http://dx.doi.org/10.1016/j.tsf.2009.03.001},
  volume       = {517},
  year         = {2009},
}

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