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High power impulse magnetron sputtering using a rotating cylindrical magnetron

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Rotatable, Thin Film, Rotating cylindrical magnetron, High Power Impulse Magnetron Sputtering, HIPIMS, IONIZATION, DEPOSITION, Magnetron Sputtering

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Citation

Please use this url to cite or link to this publication:

Chicago
Leroy, Wouter, Arutiun Ehiasarian, Stijn Mahieu, and Diederik Depla. 2010. “High Power Impulse Magnetron Sputtering Using a Rotating Cylindrical Magnetron.” Journal of Vacuum Science & Technology A 28 (1): 108–111.
APA
Leroy, W., Ehiasarian, A., Mahieu, S., & Depla, D. (2010). High power impulse magnetron sputtering using a rotating cylindrical magnetron. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 28(1), 108–111.
Vancouver
1.
Leroy W, Ehiasarian A, Mahieu S, Depla D. High power impulse magnetron sputtering using a rotating cylindrical magnetron. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2010;28(1):108–11.
MLA
Leroy, Wouter, Arutiun Ehiasarian, Stijn Mahieu, et al. “High Power Impulse Magnetron Sputtering Using a Rotating Cylindrical Magnetron.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 28.1 (2010): 108–111. Print.
@article{779598,
  author       = {Leroy, Wouter and Ehiasarian, Arutiun and Mahieu, Stijn and Depla, Diederik},
  issn         = {0734-2101},
  journal      = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A},
  language     = {eng},
  number       = {1},
  pages        = {108--111},
  title        = {High power impulse magnetron sputtering using a rotating cylindrical magnetron},
  url          = {http://dx.doi.org/10.1116/1.3271136},
  volume       = {28},
  year         = {2010},
}

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