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In situ study of the formation of silicide phases in amorphous Co-Si mixed layers

(2010) MICROELECTRONIC ENGINEERING. 87(3). p.282-285
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Keywords
Nucleation, Cobalt silicides, Grain size, In situ XRD, EBSD, MIXING ENTROPY, NUCLEATION, COSI2

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Citation

Please use this url to cite or link to this publication:

MLA
Van Bockstael, Charlotte et al. “In Situ Study of the Formation of Silicide Phases in Amorphous Co-Si Mixed Layers.” MICROELECTRONIC ENGINEERING 87.3 (2010): 282–285. Print.
APA
Van Bockstael, C., De Keyser, K., Demeulemeester, J., Vantomme, A., Vanmeirhaeghe, R., Detavernier, C., Jordan-Sweet, J., et al. (2010). In situ study of the formation of silicide phases in amorphous Co-Si mixed layers. MICROELECTRONIC ENGINEERING, 87(3), 282–285. Presented at the 18th European Workshop on Materials for Advanced Metallization.
Chicago author-date
Van Bockstael, Charlotte, Koen De Keyser, Jelle Demeulemeester, André Vantomme, Roland Vanmeirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2010. “In Situ Study of the Formation of Silicide Phases in Amorphous Co-Si Mixed Layers.” Microelectronic Engineering 87 (3): 282–285.
Chicago author-date (all authors)
Van Bockstael, Charlotte, Koen De Keyser, Jelle Demeulemeester, André Vantomme, Roland Vanmeirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2010. “In Situ Study of the Formation of Silicide Phases in Amorphous Co-Si Mixed Layers.” Microelectronic Engineering 87 (3): 282–285.
Vancouver
1.
Van Bockstael C, De Keyser K, Demeulemeester J, Vantomme A, Vanmeirhaeghe R, Detavernier C, et al. In situ study of the formation of silicide phases in amorphous Co-Si mixed layers. MICROELECTRONIC ENGINEERING. 2010;87(3):282–5.
IEEE
[1]
C. Van Bockstael et al., “In situ study of the formation of silicide phases in amorphous Co-Si mixed layers,” MICROELECTRONIC ENGINEERING, vol. 87, no. 3, pp. 282–285, 2010.
@article{759405,
  author       = {Van Bockstael, Charlotte and De Keyser, Koen and Demeulemeester, Jelle and Vantomme, André and Vanmeirhaeghe, Roland and Detavernier, Christophe and Jordan-Sweet, Jean and Lavoie, Christian},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keywords     = {Nucleation,Cobalt silicides,Grain size,In situ XRD,EBSD,MIXING ENTROPY,NUCLEATION,COSI2},
  language     = {eng},
  location     = {Grenoble, France},
  number       = {3},
  pages        = {282--285},
  title        = {In situ study of the formation of silicide phases in amorphous Co-Si mixed layers},
  url          = {http://dx.doi.org/10.1016/j.mee.2009.07.011},
  volume       = {87},
  year         = {2010},
}

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