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In situ study of the formation of silicide phases in amorphous Co-Si mixed layers

Charlotte Van Bockstael UGent, Koen De Keyser UGent, Jelle Demeulemeester, André Vantomme, Roland Vanmeirhaeghe UGent, Christophe Detavernier UGent, Jean Jordan-Sweet and Christian Lavoie (2010) MICROELECTRONIC ENGINEERING. 87(3). p.282-285
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (proceedingsPaper)
publication status
published
subject
keyword
Nucleation, Cobalt silicides, Grain size, In situ XRD, EBSD, MIXING ENTROPY, NUCLEATION, COSI2
journal title
MICROELECTRONIC ENGINEERING
Microelectron. Eng.
volume
87
issue
3
pages
282 - 285
conference name
18th European Workshop on Materials for Advanced Metallization
conference location
Grenoble, France
conference start
2009-03-08
conference end
2009-03-11
Web of Science type
Proceedings Paper
Web of Science id
000275221600011
JCR category
ENGINEERING, ELECTRICAL & ELECTRONIC
JCR impact factor
1.569 (2010)
JCR rank
66/247 (2010)
JCR quartile
2 (2010)
ISSN
0167-9317
DOI
10.1016/j.mee.2009.07.011
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
759405
handle
http://hdl.handle.net/1854/LU-759405
date created
2009-09-30 21:33:12
date last changed
2010-06-30 10:54:51
@article{759405,
  author       = {Van Bockstael, Charlotte and De Keyser, Koen and Demeulemeester, Jelle and Vantomme, Andr{\'e} and Vanmeirhaeghe, Roland and Detavernier, Christophe and Jordan-Sweet, Jean and Lavoie, Christian},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {Nucleation,Cobalt silicides,Grain size,In situ XRD,EBSD,MIXING ENTROPY,NUCLEATION,COSI2},
  language     = {eng},
  location     = {Grenoble, France},
  number       = {3},
  pages        = {282--285},
  title        = {In situ study of the formation of silicide phases in amorphous Co-Si mixed layers},
  url          = {http://dx.doi.org/10.1016/j.mee.2009.07.011},
  volume       = {87},
  year         = {2010},
}

Chicago
Van Bockstael, Charlotte, Koen De Keyser, Jelle Demeulemeester, André Vantomme, Roland Vanmeirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2010. “In Situ Study of the Formation of Silicide Phases in Amorphous Co-Si Mixed Layers.” Microelectronic Engineering 87 (3): 282–285.
APA
Van Bockstael, C., De Keyser, K., Demeulemeester, J., Vantomme, A., Vanmeirhaeghe, R., Detavernier, C., Jordan-Sweet, J., et al. (2010). In situ study of the formation of silicide phases in amorphous Co-Si mixed layers. MICROELECTRONIC ENGINEERING, 87(3), 282–285. Presented at the 18th European Workshop on Materials for Advanced Metallization.
Vancouver
1.
Van Bockstael C, De Keyser K, Demeulemeester J, Vantomme A, Vanmeirhaeghe R, Detavernier C, et al. In situ study of the formation of silicide phases in amorphous Co-Si mixed layers. MICROELECTRONIC ENGINEERING. 2010;87(3):282–5.
MLA
Van Bockstael, Charlotte, Koen De Keyser, Jelle Demeulemeester, et al. “In Situ Study of the Formation of Silicide Phases in Amorphous Co-Si Mixed Layers.” MICROELECTRONIC ENGINEERING 87.3 (2010): 282–285. Print.