Advanced search

Influence of Al content on the properties of MgO grown by reactive magnetron sputtering

(2009) PLASMA PROCESSES AND POLYMERS. 6(suppl. 1). p.S751-S754
Author
Organization
Abstract
DC reactive magnetron sputtering was applied to deposit mixed oxide thin films. To modify the stoichiometry of the thin film in a flexible way, co-sputter deposition with metal targets mounted on two separate magnetrons was used. A series of coatings was produced with a stoichiometry of the thin film ranging from MgO, over MgxAlyOz to Al2O3. The influence of the stoichiometry on several properties of these thin films was investigated. Surface energy, crystallinity, hardness, refractive index and surface roughness were measured. A clear relationship between all properties and the stoichiometry was found, indicating a critical composition region where the properties exhibit an abrupt change. To understand this behaviour, the crystallographic and morphology were studied using a combination of XRD, SEM and TEM, indicating that the addition of Al influences the growth mechanism of MgO.
Keywords
sputtering, oxides, surface energy, thin films, X-ray, MAGNESIUM ALUMINATE SPINEL, THIN-FILMS, BIAXIAL ALIGNMENT, MGAL2O4, DEPOSITION, POLYMERS, SENSORS, MODELS, ENERGY

Citation

Please use this url to cite or link to this publication:

Chicago
Martins Saraiva, Marta, Chen Hong, Wouter Leroy, Stijn Mahieu, Neerushana Jehanathan, Oleg Lebedev, Violetta Georgieva, Rosita Persoons, and Diederik Depla. 2009. “Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering.” Plasma Processes and Polymers 6 (suppl. 1): S751–S754.
APA
Martins Saraiva, M., Hong, C., Leroy, W., Mahieu, S., Jehanathan, N., Lebedev, O., Georgieva, V., et al. (2009). Influence of Al content on the properties of MgO grown by reactive magnetron sputtering. PLASMA PROCESSES AND POLYMERS, 6(suppl. 1), S751–S754. Presented at the 11th International Conference on Plasma Surface Engineering (PSE 2008).
Vancouver
1.
Martins Saraiva M, Hong C, Leroy W, Mahieu S, Jehanathan N, Lebedev O, et al. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering. PLASMA PROCESSES AND POLYMERS. 2009;6(suppl. 1):S751–S754.
MLA
Martins Saraiva, Marta, Chen Hong, Wouter Leroy, et al. “Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering.” PLASMA PROCESSES AND POLYMERS 6.suppl. 1 (2009): S751–S754. Print.
@article{734678,
  abstract     = {DC reactive magnetron sputtering was applied to deposit mixed oxide thin films. To modify the stoichiometry of the thin film in a flexible way, co-sputter deposition with metal targets mounted on two separate magnetrons was used. A series of coatings was produced with a stoichiometry of the thin film ranging from MgO, over MgxAlyOz to Al2O3. The influence of the stoichiometry on several properties of these thin films was investigated. Surface energy, crystallinity, hardness, refractive index and surface roughness were measured. A clear relationship between all properties and the stoichiometry was found, indicating a critical composition region where the properties exhibit an abrupt change. To understand this behaviour, the crystallographic and morphology were studied using a combination of XRD, SEM and TEM, indicating that the addition of Al influences the growth mechanism of MgO.},
  author       = {Martins Saraiva, Marta and Hong, Chen and Leroy, Wouter and Mahieu, Stijn and Jehanathan, Neerushana and Lebedev, Oleg and Georgieva, Violetta and Persoons, Rosita and Depla, Diederik},
  issn         = {1612-8850},
  journal      = {PLASMA PROCESSES AND POLYMERS},
  language     = {eng},
  location     = {Garmisch-Partenkirchen, Germany},
  number       = {suppl. 1},
  pages        = {S751--S754},
  title        = {Influence of Al content on the properties of MgO grown by reactive magnetron sputtering},
  url          = {http://dx.doi.org/10.1002/ppap.200931809},
  volume       = {6},
  year         = {2009},
}

Altmetric
View in Altmetric
Web of Science
Times cited: