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Introduction of amino groups on the surface of thin photo definable epoxy resin layers via chemical modification

David Schaubroeck (UGent) , Johan De Baets (UGent) , Tim Desmet (UGent) , Sandra Van Vlierberghe (UGent) , Etienne Schacht (UGent) and André Van Calster (UGent)
(2009) APPLIED SURFACE SCIENCE. 255(21). p.8780-8787
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Organization
Abstract
The introduction of amine groups on the surface of dielectric resins improves the adhesion with electrochemically deposited metals. In this work, etched epoxy resin surfaces are modified with aliphatic amines via a two step wet chemical reaction approach. First, cyanuric chloride is introduced on the surface. Next, the remaining reactive sites of cyanuric chloride are used to couple an aliphatic polyamine. Both reaction steps are optimized by variation of reaction parameters such as concentration, chemicals, temperature and time. A detailed surface characterization after each reaction step is provided using following techniques: ATR-IR, SEM-EDS, XPS and AFM.
Keywords
INFRARED SPECTRA, ELECTROLESS DEPOSITION, CONTAINING VINYL MONOMERS, POLYIMIDE FILMS, GRAFT-COPOLYMERIZATION, epoxy cresol novolac resin, surface modification, cyanuric chloride, POLYMER LAYERS, ADHESION IMPROVEMENT, PLASMA TREATMENT, BUILDUP LAYERS, S-TRIAZINE

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Chicago
Schaubroeck, David, Johan De Baets, Tim Desmet, Sandra Van Vlierberghe, Etienne Schacht, and André Van Calster. 2009. “Introduction of Amino Groups on the Surface of Thin Photo Definable Epoxy Resin Layers via Chemical Modification.” Applied Surface Science 255 (21): 8780–8787.
APA
Schaubroeck, D., De Baets, J., Desmet, T., Van Vlierberghe, S., Schacht, E., & Van Calster, A. (2009). Introduction of amino groups on the surface of thin photo definable epoxy resin layers via chemical modification. APPLIED SURFACE SCIENCE, 255(21), 8780–8787.
Vancouver
1.
Schaubroeck D, De Baets J, Desmet T, Van Vlierberghe S, Schacht E, Van Calster A. Introduction of amino groups on the surface of thin photo definable epoxy resin layers via chemical modification. APPLIED SURFACE SCIENCE. 2009;255(21):8780–7.
MLA
Schaubroeck, David, Johan De Baets, Tim Desmet, et al. “Introduction of Amino Groups on the Surface of Thin Photo Definable Epoxy Resin Layers via Chemical Modification.” APPLIED SURFACE SCIENCE 255.21 (2009): 8780–8787. Print.
@article{721759,
  abstract     = {The introduction of amine groups on the surface of dielectric resins improves the adhesion with electrochemically deposited metals. In this work, etched epoxy resin surfaces are modified with aliphatic amines via a two step wet chemical reaction approach. First, cyanuric chloride is introduced on the surface. Next, the remaining reactive sites of cyanuric chloride are used to couple an aliphatic polyamine. Both reaction steps are optimized by variation of reaction parameters such as concentration, chemicals, temperature and time. A detailed surface characterization after each reaction step is provided using following techniques: ATR-IR, SEM-EDS, XPS and AFM.},
  author       = {Schaubroeck, David and De Baets, Johan and Desmet, Tim and Van Vlierberghe, Sandra and Schacht, Etienne and Van Calster, Andr{\'e}},
  issn         = {0169-4332},
  journal      = {APPLIED SURFACE SCIENCE},
  language     = {eng},
  number       = {21},
  pages        = {8780--8787},
  title        = {Introduction of amino groups on the surface of thin photo definable epoxy resin layers via chemical modification},
  url          = {http://dx.doi.org/10.1016/j.apsusc.2009.06.043},
  volume       = {255},
  year         = {2009},
}

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