Advanced search
1 file | 330.87 KB Add to list

Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results

Wouter Leroy (UGent) , Stijn Mahieu (UGent) , Rosita Persoons and Diederik Depla (UGent)
(2009) THIN SOLID FILMS. 518(5). p.1527-1531
Author
Organization
Keywords
Sticking coefficient, ADSORPTION, Incorporation coefficient, Mass spectrometry, Reactive magnetron sputtering, THIN-FILMS, TITANIUM NITRIDE, Oxides, DEPOSITION, OXYGEN, OXIDATION

Downloads

  • (...).pdf
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 330.87 KB

Citation

Please use this url to cite or link to this publication:

MLA
Leroy, Wouter et al. “Quantification of the Incorporation Coefficient of a Reactive Gas on a Metallic Film During Magnetron Sputtering: The Method and Results.” THIN SOLID FILMS 518.5 (2009): 1527–1531. Print.
APA
Leroy, W., Mahieu, S., Persoons, R., & Depla, D. (2009). Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results. THIN SOLID FILMS, 518(5), 1527–1531. Presented at the 36th International conference on Metallurgical Coatings and Thin Films.
Chicago author-date
Leroy, Wouter, Stijn Mahieu, Rosita Persoons, and Diederik Depla. 2009. “Quantification of the Incorporation Coefficient of a Reactive Gas on a Metallic Film During Magnetron Sputtering: The Method and Results.” Thin Solid Films 518 (5): 1527–1531.
Chicago author-date (all authors)
Leroy, Wouter, Stijn Mahieu, Rosita Persoons, and Diederik Depla. 2009. “Quantification of the Incorporation Coefficient of a Reactive Gas on a Metallic Film During Magnetron Sputtering: The Method and Results.” Thin Solid Films 518 (5): 1527–1531.
Vancouver
1.
Leroy W, Mahieu S, Persoons R, Depla D. Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results. THIN SOLID FILMS. 2009;518(5):1527–31.
IEEE
[1]
W. Leroy, S. Mahieu, R. Persoons, and D. Depla, “Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results,” THIN SOLID FILMS, vol. 518, no. 5, pp. 1527–1531, 2009.
@article{721002,
  author       = {Leroy, Wouter and Mahieu, Stijn and Persoons, Rosita and Depla, Diederik},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  keywords     = {Sticking coefficient,ADSORPTION,Incorporation coefficient,Mass spectrometry,Reactive magnetron sputtering,THIN-FILMS,TITANIUM NITRIDE,Oxides,DEPOSITION,OXYGEN,OXIDATION},
  language     = {eng},
  location     = {San Diego, CA, USA},
  number       = {5},
  pages        = {1527--1531},
  title        = {Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results},
  url          = {http://dx.doi.org/10.1016/j.tsf.2009.07.190},
  volume       = {518},
  year         = {2009},
}

Altmetric
View in Altmetric
Web of Science
Times cited: