Advanced search
1 file | 953.02 KB Add to list

Hysteresis behavior during facing target magnetron sputtering

Florian Cougnon (UGent) , Koen Strijckmans (UGent) , Roeland Schelfhout (UGent) and Diederik Depla (UGent)
Author
Organization
Keywords
Facing target sputtering, Hysteresis, Reactive magnetron sputtering, Modelling, OXIDE THIN-FILMS, ELECTRICAL-PROPERTIES, LOW-TEMPERATURE, SYSTEM, DEPOSITION, DISCHARGE, COMBINATORIAL, EROSION, PLASMA

Downloads

  • (...).pdf
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 953.02 KB

Citation

Please use this url to cite or link to this publication:

MLA
Cougnon, Florian et al. “Hysteresis Behavior During Facing Target Magnetron Sputtering.” SURFACE & COATINGS TECHNOLOGY 294 (2016): 215–219. Print.
APA
Cougnon, F., Strijckmans, K., Schelfhout, R., & Depla, D. (2016). Hysteresis behavior during facing target magnetron sputtering. SURFACE & COATINGS TECHNOLOGY, 294, 215–219.
Chicago author-date
Cougnon, Florian, Koen Strijckmans, Roeland Schelfhout, and Diederik Depla. 2016. “Hysteresis Behavior During Facing Target Magnetron Sputtering.” Surface & Coatings Technology 294: 215–219.
Chicago author-date (all authors)
Cougnon, Florian, Koen Strijckmans, Roeland Schelfhout, and Diederik Depla. 2016. “Hysteresis Behavior During Facing Target Magnetron Sputtering.” Surface & Coatings Technology 294: 215–219.
Vancouver
1.
Cougnon F, Strijckmans K, Schelfhout R, Depla D. Hysteresis behavior during facing target magnetron sputtering. SURFACE & COATINGS TECHNOLOGY. 2016;294:215–9.
IEEE
[1]
F. Cougnon, K. Strijckmans, R. Schelfhout, and D. Depla, “Hysteresis behavior during facing target magnetron sputtering,” SURFACE & COATINGS TECHNOLOGY, vol. 294, pp. 215–219, 2016.
@article{7180028,
  author       = {Cougnon, Florian and Strijckmans, Koen and Schelfhout, Roeland and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE & COATINGS TECHNOLOGY},
  keywords     = {Facing target sputtering,Hysteresis,Reactive magnetron sputtering,Modelling,OXIDE THIN-FILMS,ELECTRICAL-PROPERTIES,LOW-TEMPERATURE,SYSTEM,DEPOSITION,DISCHARGE,COMBINATORIAL,EROSION,PLASMA},
  language     = {eng},
  pages        = {215--219},
  title        = {Hysteresis behavior during facing target magnetron sputtering},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2016.03.096},
  volume       = {294},
  year         = {2016},
}

Altmetric
View in Altmetric
Web of Science
Times cited: