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Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filters

Sarvagya Dwivedi (UGent) , Herbert D'heer (UGent) and Wim Bogaerts (UGent)
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Center for nano- and biophotonics (NB-Photonics)
Abstract
We propose a method to make silicon optical finite impulse response filters tolerant to fabrication (waveguide geometry) and ambient thermal variations. We experimentally demonstrate a Mach-Zehnder interferometer filter with fabrication and thermal tolerance, both separately and together. The fabrication-tolerant device measurements show a 20-fold improved tolerance to systematic waveguide linewidth variations with a wavelength shift of <60 pm/nm linewidth change. The fabrication-and thermal-tolerant device is possible using orthogonal polarizations in the two arms. The fabricated device shows a shift of less than +/- 65 pm/nm and a thermal drift smaller than +/- 15 pm/K over a wavelength range of 40 nm. Simulations show that this concept can be extended to multichannel filters.
Keywords
WDM, Silicon photonics, RESONATORS, athermal, fabrication tolerances, wavelength filtering devices

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Citation

Please use this url to cite or link to this publication:

Chicago
Dwivedi, Sarvagya, Herbert D’heer, and Wim Bogaerts. 2015. “Maximizing Fabrication and Thermal Tolerances of All-silicon FIR Wavelength Filters.” Ieee Photonics Technology Letters 27 (8): 871–874.
APA
Dwivedi, S., D’heer, H., & Bogaerts, W. (2015). Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filters. IEEE PHOTONICS TECHNOLOGY LETTERS, 27(8), 871–874.
Vancouver
1.
Dwivedi S, D’heer H, Bogaerts W. Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filters. IEEE PHOTONICS TECHNOLOGY LETTERS. PISCATAWAY: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC; 2015;27(8):871–4.
MLA
Dwivedi, Sarvagya, Herbert D’heer, and Wim Bogaerts. “Maximizing Fabrication and Thermal Tolerances of All-silicon FIR Wavelength Filters.” IEEE PHOTONICS TECHNOLOGY LETTERS 27.8 (2015): 871–874. Print.
@article{7062418,
  abstract     = {We propose a method to make silicon optical finite impulse response filters tolerant to fabrication (waveguide geometry) and ambient thermal variations. We experimentally demonstrate a Mach-Zehnder interferometer filter with fabrication and thermal tolerance, both separately and together. The fabrication-tolerant device measurements show a 20-fold improved tolerance to systematic waveguide linewidth variations with a wavelength shift of {\textlangle}60 pm/nm linewidth change. The fabrication-and thermal-tolerant device is possible using orthogonal polarizations in the two arms. The fabricated device shows a shift of less than +/- 65 pm/nm and a thermal drift smaller than +/- 15 pm/K over a wavelength range of 40 nm. Simulations show that this concept can be extended to multichannel filters.},
  author       = {Dwivedi, Sarvagya and D'heer, Herbert and Bogaerts, Wim},
  issn         = {1041-1135},
  journal      = {IEEE PHOTONICS TECHNOLOGY LETTERS},
  language     = {eng},
  number       = {8},
  pages        = {871--874},
  publisher    = {IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC},
  title        = {Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filters},
  url          = {http://dx.doi.org/10.1109/LPT.2015.2398464},
  volume       = {27},
  year         = {2015},
}

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