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On the target surface cleanness during magnetron sputtering

(2015) APPLIED SURFACE SCIENCE. 355. p.743-747
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Keywords
modelling, sputter yield, magnetron, chemisorption, POLYCRYSTALLINE TANTALUM, DISCHARGE VOLTAGE, OXIDATION, OXYGEN, ADSORPTION, PRESSURES

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Citation

Please use this url to cite or link to this publication:

MLA
Schelfhout, Roeland et al. “On the Target Surface Cleanness During Magnetron Sputtering.” APPLIED SURFACE SCIENCE 355 (2015): 743–747. Print.
APA
Schelfhout, R., Strijckmans, K., Boydens, F., & Depla, D. (2015). On the target surface cleanness during magnetron sputtering. APPLIED SURFACE SCIENCE, 355, 743–747.
Chicago author-date
Schelfhout, Roeland, Koen Strijckmans, Francis Boydens, and Diederik Depla. 2015. “On the Target Surface Cleanness During Magnetron Sputtering.” Applied Surface Science 355: 743–747.
Chicago author-date (all authors)
Schelfhout, Roeland, Koen Strijckmans, Francis Boydens, and Diederik Depla. 2015. “On the Target Surface Cleanness During Magnetron Sputtering.” Applied Surface Science 355: 743–747.
Vancouver
1.
Schelfhout R, Strijckmans K, Boydens F, Depla D. On the target surface cleanness during magnetron sputtering. APPLIED SURFACE SCIENCE. 2015;355:743–7.
IEEE
[1]
R. Schelfhout, K. Strijckmans, F. Boydens, and D. Depla, “On the target surface cleanness during magnetron sputtering,” APPLIED SURFACE SCIENCE, vol. 355, pp. 743–747, 2015.
@article{6891590,
  author       = {{Schelfhout, Roeland and Strijckmans, Koen and Boydens, Francis and Depla, Diederik}},
  issn         = {{0169-4332}},
  journal      = {{APPLIED SURFACE SCIENCE}},
  keywords     = {{modelling,sputter yield,magnetron,chemisorption,POLYCRYSTALLINE TANTALUM,DISCHARGE VOLTAGE,OXIDATION,OXYGEN,ADSORPTION,PRESSURES}},
  language     = {{eng}},
  pages        = {{743--747}},
  title        = {{On the target surface cleanness during magnetron sputtering}},
  url          = {{http://dx.doi.org/10.1016/j.apsusc.2015.07.073}},
  volume       = {{355}},
  year         = {{2015}},
}

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