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On the target surface cleanness during magnetron sputtering

Roeland Schelfhout (UGent) , Koen Strijckmans (UGent) , Francis Boydens (UGent) and Diederik Depla (UGent)
(2015) APPLIED SURFACE SCIENCE. 355. p.743-747
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Keywords
modelling, sputter yield, magnetron, chemisorption, POLYCRYSTALLINE TANTALUM, DISCHARGE VOLTAGE, OXIDATION, OXYGEN, ADSORPTION, PRESSURES

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Citation

Please use this url to cite or link to this publication:

Chicago
Schelfhout, Roeland, Koen Strijckmans, Francis Boydens, and Diederik Depla. 2015. “On the Target Surface Cleanness During Magnetron Sputtering.” Applied Surface Science 355: 743–747.
APA
Schelfhout, R., Strijckmans, K., Boydens, F., & Depla, D. (2015). On the target surface cleanness during magnetron sputtering. APPLIED SURFACE SCIENCE, 355, 743–747.
Vancouver
1.
Schelfhout R, Strijckmans K, Boydens F, Depla D. On the target surface cleanness during magnetron sputtering. APPLIED SURFACE SCIENCE. 2015;355:743–7.
MLA
Schelfhout, Roeland, Koen Strijckmans, Francis Boydens, et al. “On the Target Surface Cleanness During Magnetron Sputtering.” APPLIED SURFACE SCIENCE 355 (2015): 743–747. Print.
@article{6891590,
  author       = {Schelfhout, Roeland and Strijckmans, Koen and Boydens, Francis and Depla, Diederik},
  issn         = {0169-4332},
  journal      = {APPLIED SURFACE SCIENCE},
  language     = {eng},
  pages        = {743--747},
  title        = {On the target surface cleanness during magnetron sputtering},
  url          = {http://dx.doi.org/10.1016/j.apsusc.2015.07.073},
  volume       = {355},
  year         = {2015},
}

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