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Study on reactive sputtering of yttrium oxide: process and thin film properties

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Microstructure, DC magnetron sputtering, Yttrium oxide thin films, Optical properties, Mechanical properties, PULSED-LASER DEPOSITION, NANOCOMPOSITE COATINGS, OPTICAL-PROPERTIES, SPRAY-PYROLYSIS, Y2O3, PHASE, STABILIZATION, BOMBARDMENT, GRAPHENE, SILICON

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Chicago
Lei, Pei, Wouter Leroy, Bing Dai, Jiaqi Zhu, Xiaoting Chen, Jiecai Han, and Diederik Depla. 2015. “Study on Reactive Sputtering of Yttrium Oxide: Process and Thin Film Properties.” Surface & Coatings Technology 276: 39–46.
APA
Lei, P., Leroy, W., Dai, B., Zhu, J., Chen, X., Han, J., & Depla, D. (2015). Study on reactive sputtering of yttrium oxide: process and thin film properties. SURFACE & COATINGS TECHNOLOGY, 276, 39–46.
Vancouver
1.
Lei P, Leroy W, Dai B, Zhu J, Chen X, Han J, et al. Study on reactive sputtering of yttrium oxide: process and thin film properties. SURFACE & COATINGS TECHNOLOGY. 2015;276:39–46.
MLA
Lei, Pei, Wouter Leroy, Bing Dai, et al. “Study on Reactive Sputtering of Yttrium Oxide: Process and Thin Film Properties.” SURFACE & COATINGS TECHNOLOGY 276 (2015): 39–46. Print.
@article{6862973,
  author       = {Lei, Pei and Leroy, Wouter and Dai, Bing and Zhu, Jiaqi and Chen, Xiaoting and Han, Jiecai and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE \& COATINGS TECHNOLOGY},
  language     = {eng},
  pages        = {39--46},
  title        = {Study on reactive sputtering of yttrium oxide: process and thin film properties},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2015.06.052},
  volume       = {276},
  year         = {2015},
}

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