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Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon

Laurent Mathey, Thibault Alphazan, Maxence Valla, Laurent Veyre, Hervé Fontaine, Virginie Enyedi, Karim Yckache, Marianne Danielou, Sébastien Kerdiles, Jean Guerrero, et al. (2015) JOURNAL OF PHYSICAL CHEMISTRY C. 119(24). p.13750-13757
abstract
Designing new approaches to incorporate dopant impurities in semi-conductor materials is essential in keeping pace with electronics miniaturization without device performance degradation. On the basis of a mild solution-phase synthetic approach to functionalize silica nanoparticles, we were able to graft tailor-made boron-molecular precursors and control the thermal release of boron in the silica framework. The molecular-level description of the surface structure lays the foundation for a structure property relationship approach, which is readily and successfully implemented to dope non-deglazed silicon wafers. As the method does not require an additional oxide capping step and shows minimal risk of carbon contamination, as demonstrated by compositional and electrical characterizations of the wafers, it is perfectly adapted to advanced microelectronics manufacturing processes.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
ICP-MS, SURFACE ORGANOMETALLIC CHEMISTRY, SEMICONDUCTOR NANOCRYSTALS, JUNCTION FORMATION, BORATE ESTERS, SPECTROSCOPY, CONTAMINANTS, FLUCTUATIONS, PERFORMANCE, METATHESIS
journal title
JOURNAL OF PHYSICAL CHEMISTRY C
J. Phys. Chem. C
volume
119
issue
24
pages
13750 - 13757
Web of Science type
Article
Web of Science id
000356754900043
JCR category
MATERIALS SCIENCE, MULTIDISCIPLINARY
JCR impact factor
4.509 (2015)
JCR rank
39/271 (2015)
JCR quartile
1 (2015)
ISSN
1932-7447
DOI
10.1021/acs.jpcc.5b03408
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
6851075
handle
http://hdl.handle.net/1854/LU-6851075
date created
2015-06-26 17:53:29
date last changed
2016-12-19 15:39:09
@article{6851075,
  abstract     = {Designing new approaches to incorporate dopant impurities in semi-conductor materials is essential in keeping pace with electronics miniaturization without device performance degradation. On the basis of a mild solution-phase synthetic approach to functionalize silica nanoparticles, we were able to graft tailor-made boron-molecular precursors and control the thermal release of boron in the silica framework. The molecular-level description of the surface structure lays the foundation for a structure property relationship approach, which is readily and successfully implemented to dope non-deglazed silicon wafers. As the method does not require an additional oxide capping step and shows minimal risk of carbon contamination, as demonstrated by compositional and electrical characterizations of the wafers, it is perfectly adapted to advanced microelectronics manufacturing processes.},
  author       = {Mathey, Laurent and Alphazan, Thibault and Valla, Maxence and Veyre, Laurent and Fontaine, Herv{\'e} and Enyedi, Virginie and Yckache, Karim and Danielou, Marianne and Kerdiles, S{\'e}bastien and Guerrero, Jean and Barnes, Jean-Paul and Veillerot, Marc and Chevalier, Nicolas and Mariolle, Denis and Bertin, Fran\c{c}ois and Durand, Corentin and Berthe, Maxime and Dendooven, Jolien and Martin, Fran\c{c}ois and Thieuleux, Chlo{\'e} and Grandidier, Bruno and Cop{\'e}ret, Christophe},
  issn         = {1932-7447},
  journal      = {JOURNAL OF PHYSICAL CHEMISTRY C},
  keyword      = {ICP-MS,SURFACE ORGANOMETALLIC CHEMISTRY,SEMICONDUCTOR NANOCRYSTALS,JUNCTION FORMATION,BORATE ESTERS,SPECTROSCOPY,CONTAMINANTS,FLUCTUATIONS,PERFORMANCE,METATHESIS},
  language     = {eng},
  number       = {24},
  pages        = {13750--13757},
  title        = {Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon},
  url          = {http://dx.doi.org/10.1021/acs.jpcc.5b03408},
  volume       = {119},
  year         = {2015},
}

Chicago
Mathey, Laurent, Thibault Alphazan, Maxence Valla, Laurent Veyre, Hervé Fontaine, Virginie Enyedi, Karim Yckache, et al. 2015. “Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-molecular Precursors for Efficient and Predictive P-doping of Silicon.” Journal of Physical Chemistry C 119 (24): 13750–13757.
APA
Mathey, L., Alphazan, T., Valla, M., Veyre, L., Fontaine, H., Enyedi, V., Yckache, K., et al. (2015). Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon. JOURNAL OF PHYSICAL CHEMISTRY C, 119(24), 13750–13757.
Vancouver
1.
Mathey L, Alphazan T, Valla M, Veyre L, Fontaine H, Enyedi V, et al. Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon. JOURNAL OF PHYSICAL CHEMISTRY C. 2015;119(24):13750–7.
MLA
Mathey, Laurent, Thibault Alphazan, Maxence Valla, et al. “Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-molecular Precursors for Efficient and Predictive P-doping of Silicon.” JOURNAL OF PHYSICAL CHEMISTRY C 119.24 (2015): 13750–13757. Print.