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Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon

(2015) JOURNAL OF PHYSICAL CHEMISTRY C. 119(24). p.13750-13757
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Abstract
Designing new approaches to incorporate dopant impurities in semi-conductor materials is essential in keeping pace with electronics miniaturization without device performance degradation. On the basis of a mild solution-phase synthetic approach to functionalize silica nanoparticles, we were able to graft tailor-made boron-molecular precursors and control the thermal release of boron in the silica framework. The molecular-level description of the surface structure lays the foundation for a structure property relationship approach, which is readily and successfully implemented to dope non-deglazed silicon wafers. As the method does not require an additional oxide capping step and shows minimal risk of carbon contamination, as demonstrated by compositional and electrical characterizations of the wafers, it is perfectly adapted to advanced microelectronics manufacturing processes.
Keywords
ICP-MS, SURFACE ORGANOMETALLIC CHEMISTRY, SEMICONDUCTOR NANOCRYSTALS, JUNCTION FORMATION, BORATE ESTERS, SPECTROSCOPY, CONTAMINANTS, FLUCTUATIONS, PERFORMANCE, METATHESIS

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Chicago
Mathey, Laurent, Thibault Alphazan, Maxence Valla, Laurent Veyre, Hervé Fontaine, Virginie Enyedi, Karim Yckache, et al. 2015. “Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-molecular Precursors for Efficient and Predictive P-doping of Silicon.” Journal of Physical Chemistry C 119 (24): 13750–13757.
APA
Mathey, L., Alphazan, T., Valla, M., Veyre, L., Fontaine, H., Enyedi, V., Yckache, K., et al. (2015). Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon. JOURNAL OF PHYSICAL CHEMISTRY C, 119(24), 13750–13757.
Vancouver
1.
Mathey L, Alphazan T, Valla M, Veyre L, Fontaine H, Enyedi V, et al. Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon. JOURNAL OF PHYSICAL CHEMISTRY C. 2015;119(24):13750–7.
MLA
Mathey, Laurent, Thibault Alphazan, Maxence Valla, et al. “Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-molecular Precursors for Efficient and Predictive P-doping of Silicon.” JOURNAL OF PHYSICAL CHEMISTRY C 119.24 (2015): 13750–13757. Print.
@article{6851075,
  abstract     = {Designing new approaches to incorporate dopant impurities in semi-conductor materials is essential in keeping pace with electronics miniaturization without device performance degradation. On the basis of a mild solution-phase synthetic approach to functionalize silica nanoparticles, we were able to graft tailor-made boron-molecular precursors and control the thermal release of boron in the silica framework. The molecular-level description of the surface structure lays the foundation for a structure property relationship approach, which is readily and successfully implemented to dope non-deglazed silicon wafers. As the method does not require an additional oxide capping step and shows minimal risk of carbon contamination, as demonstrated by compositional and electrical characterizations of the wafers, it is perfectly adapted to advanced microelectronics manufacturing processes.},
  author       = {Mathey, Laurent and Alphazan, Thibault and Valla, Maxence and Veyre, Laurent and Fontaine, Herv{\'e} and Enyedi, Virginie and Yckache, Karim and Danielou, Marianne and Kerdiles, S{\'e}bastien and Guerrero, Jean and Barnes, Jean-Paul and Veillerot, Marc and Chevalier, Nicolas and Mariolle, Denis and Bertin, Fran\c{c}ois and Durand, Corentin and Berthe, Maxime and Dendooven, Jolien and Martin, Fran\c{c}ois and Thieuleux, Chlo{\'e} and Grandidier, Bruno and Cop{\'e}ret, Christophe},
  issn         = {1932-7447},
  journal      = {JOURNAL OF PHYSICAL CHEMISTRY C},
  keyword      = {ICP-MS,SURFACE ORGANOMETALLIC CHEMISTRY,SEMICONDUCTOR NANOCRYSTALS,JUNCTION FORMATION,BORATE ESTERS,SPECTROSCOPY,CONTAMINANTS,FLUCTUATIONS,PERFORMANCE,METATHESIS},
  language     = {eng},
  number       = {24},
  pages        = {13750--13757},
  title        = {Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon},
  url          = {http://dx.doi.org/10.1021/acs.jpcc.5b03408},
  volume       = {119},
  year         = {2015},
}

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