Focused-ion-beam fabrication of slots in silicon waveguides and ring resonators
- Author
- Jonathan Schrauwen (UGent) , Jeroen Van Lysebettens, Tom Claes (UGent) , Katrien De Vos (UGent) , Peter Bienstman (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)
- Organization
- Abstract
- We present the focused-ion-beam fabrication of slots in existing silicon waveguides and racetrack resonators. The etch process was conducted with iodine enhancement and an alumina hard mask. We demonstrate a propagation loss of 100 dB/cm for slot waveguides and a Q value of 850 for slot racetrack resonators with bend radius of 6 mu m.
- Keywords
- resonator, Focused ion beam, silicon, slot waveguide
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-667923
- MLA
- Schrauwen, Jonathan, et al. “Focused-Ion-Beam Fabrication of Slots in Silicon Waveguides and Ring Resonators.” IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 20, no. 23, 2008, pp. 2004–06, doi:10.1109/LPT.2008.2006001.
- APA
- Schrauwen, J., Van Lysebettens, J., Claes, T., De Vos, K., Bienstman, P., Van Thourhout, D., & Baets, R. (2008). Focused-ion-beam fabrication of slots in silicon waveguides and ring resonators. IEEE PHOTONICS TECHNOLOGY LETTERS, 20(23), 2004–2006. https://doi.org/10.1109/LPT.2008.2006001
- Chicago author-date
- Schrauwen, Jonathan, Jeroen Van Lysebettens, Tom Claes, Katrien De Vos, Peter Bienstman, Dries Van Thourhout, and Roel Baets. 2008. “Focused-Ion-Beam Fabrication of Slots in Silicon Waveguides and Ring Resonators.” IEEE PHOTONICS TECHNOLOGY LETTERS 20 (23): 2004–6. https://doi.org/10.1109/LPT.2008.2006001.
- Chicago author-date (all authors)
- Schrauwen, Jonathan, Jeroen Van Lysebettens, Tom Claes, Katrien De Vos, Peter Bienstman, Dries Van Thourhout, and Roel Baets. 2008. “Focused-Ion-Beam Fabrication of Slots in Silicon Waveguides and Ring Resonators.” IEEE PHOTONICS TECHNOLOGY LETTERS 20 (23): 2004–2006. doi:10.1109/LPT.2008.2006001.
- Vancouver
- 1.Schrauwen J, Van Lysebettens J, Claes T, De Vos K, Bienstman P, Van Thourhout D, et al. Focused-ion-beam fabrication of slots in silicon waveguides and ring resonators. IEEE PHOTONICS TECHNOLOGY LETTERS. 2008;20(23):2004–6.
- IEEE
- [1]J. Schrauwen et al., “Focused-ion-beam fabrication of slots in silicon waveguides and ring resonators,” IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 20, no. 23, pp. 2004–2006, 2008.
@article{667923,
abstract = {{We present the focused-ion-beam fabrication of slots in existing silicon waveguides and racetrack resonators. The etch process was conducted with iodine enhancement and an alumina hard mask. We demonstrate a propagation loss of 100 dB/cm for slot waveguides and a Q value of 850 for slot racetrack resonators with bend radius of 6 mu m.}},
author = {{Schrauwen, Jonathan and Van Lysebettens, Jeroen and Claes, Tom and De Vos, Katrien and Bienstman, Peter and Van Thourhout, Dries and Baets, Roel}},
issn = {{1041-1135}},
journal = {{IEEE PHOTONICS TECHNOLOGY LETTERS}},
keywords = {{resonator,Focused ion beam,silicon,slot waveguide}},
language = {{eng}},
number = {{23}},
pages = {{2004--2006}},
title = {{Focused-ion-beam fabrication of slots in silicon waveguides and ring resonators}},
url = {{http://dx.doi.org/10.1109/LPT.2008.2006001}},
volume = {{20}},
year = {{2008}},
}
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