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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

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OPTICAL-PROPERTIES, OXIDATION, INSULATOR TRANSITION, ELECTRICAL-PROPERTIES, OXIDE THIN-FILMS, CATALYSTS, MAGNETRON-SPUTTERED V2O5, ATOMIC LAYER DEPOSITION, BEHAVIOR, ALD

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Citation

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Chicago
Musschoot, Jan, Davy Deduytsche, Hilde Poelman, Johan Haemers, Roland Vanmeirhaeghe, Sven Van den Berghe, and Christophe Detavernier. 2009. “Comparison of Thermal and Plasma Enhanced ALD/CVD of Vanadium Pentoxide.” Journal of the Electrochemical Society 156 (7): P122–P126.
APA
Musschoot, J., Deduytsche, D., Poelman, H., Haemers, J., Vanmeirhaeghe, R., Van den Berghe, S., & Detavernier, C. (2009). Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 156(7), P122–P126.
Vancouver
1.
Musschoot J, Deduytsche D, Poelman H, Haemers J, Vanmeirhaeghe R, Van den Berghe S, et al. Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 2009;156(7):P122–P126.
MLA
Musschoot, Jan, Davy Deduytsche, Hilde Poelman, et al. “Comparison of Thermal and Plasma Enhanced ALD/CVD of Vanadium Pentoxide.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 156.7 (2009): P122–P126. Print.
@article{662563,
  author       = {Musschoot, Jan and Deduytsche, Davy and Poelman, Hilde and Haemers, Johan and Vanmeirhaeghe, Roland and Van den Berghe, Sven and Detavernier, Christophe},
  issn         = {0013-4651},
  journal      = {JOURNAL OF THE ELECTROCHEMICAL SOCIETY},
  keyword      = {OPTICAL-PROPERTIES,OXIDATION,INSULATOR TRANSITION,ELECTRICAL-PROPERTIES,OXIDE THIN-FILMS,CATALYSTS,MAGNETRON-SPUTTERED V2O5,ATOMIC LAYER DEPOSITION,BEHAVIOR,ALD},
  language     = {eng},
  number       = {7},
  pages        = {P122--P126},
  title        = {Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide},
  url          = {http://dx.doi.org/10.1149/1.3133169},
  volume       = {156},
  year         = {2009},
}

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