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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan Musschoot UGent, Davy Deduytsche UGent, Hilde Poelman UGent, Johan Haemers UGent, Roland Vanmeirhaeghe, Sven Van den Berghe and Christophe Detavernier UGent (2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(7). p.P122-P126
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
OPTICAL-PROPERTIES, OXIDATION, INSULATOR TRANSITION, ELECTRICAL-PROPERTIES, OXIDE THIN-FILMS, CATALYSTS, MAGNETRON-SPUTTERED V2O5, ATOMIC LAYER DEPOSITION, BEHAVIOR, ALD
journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
J. Electrochem. Soc.
volume
156
issue
7
pages
P122 - P126
Web of Science type
Article
Web of Science id
000267887500086
JCR category
MATERIALS SCIENCE, COATINGS & FILMS
JCR impact factor
2.241 (2009)
JCR rank
1/16 (2009)
JCR quartile
1 (2009)
ISSN
0013-4651
DOI
10.1149/1.3133169
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
662563
handle
http://hdl.handle.net/1854/LU-662563
date created
2009-05-20 11:13:09
date last changed
2016-12-19 15:43:35
@article{662563,
  author       = {Musschoot, Jan and Deduytsche, Davy and Poelman, Hilde and Haemers, Johan and Vanmeirhaeghe, Roland and Van den Berghe, Sven and Detavernier, Christophe},
  issn         = {0013-4651},
  journal      = {JOURNAL OF THE ELECTROCHEMICAL SOCIETY},
  keyword      = {OPTICAL-PROPERTIES,OXIDATION,INSULATOR TRANSITION,ELECTRICAL-PROPERTIES,OXIDE THIN-FILMS,CATALYSTS,MAGNETRON-SPUTTERED V2O5,ATOMIC LAYER DEPOSITION,BEHAVIOR,ALD},
  language     = {eng},
  number       = {7},
  pages        = {P122--P126},
  title        = {Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide},
  url          = {http://dx.doi.org/10.1149/1.3133169},
  volume       = {156},
  year         = {2009},
}

Chicago
Musschoot, Jan, Davy Deduytsche, Hilde Poelman, Johan Haemers, Roland Vanmeirhaeghe, Sven Van den Berghe, and Christophe Detavernier. 2009. “Comparison of Thermal and Plasma Enhanced ALD/CVD of Vanadium Pentoxide.” Journal of the Electrochemical Society 156 (7): P122–P126.
APA
Musschoot, J., Deduytsche, D., Poelman, H., Haemers, J., Vanmeirhaeghe, R., Van den Berghe, S., & Detavernier, C. (2009). Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 156(7), P122–P126.
Vancouver
1.
Musschoot J, Deduytsche D, Poelman H, Haemers J, Vanmeirhaeghe R, Van den Berghe S, et al. Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 2009;156(7):P122–P126.
MLA
Musschoot, Jan, Davy Deduytsche, Hilde Poelman, et al. “Comparison of Thermal and Plasma Enhanced ALD/CVD of Vanadium Pentoxide.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 156.7 (2009): P122–P126. Print.