Academic Bibliography

 Search 200 years of publications by Ghent University researchers.
Advanced search
1 file | 1.57 MB
Add to list
  1. Search results
  2. Iodine enhanced focused ion beam etch...

Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping

Jonathan Schrauwen (UGent) , Jeroen Van Lysebettens, Michiel Vanhoutte (UGent) , Dries Van Thourhout (UGent) and Roel Baets (UGent)
(2008) International Workshop on FIB for Photonics, 1st, Proceedings. p.4-7
Author
Organization

Downloads

  • Download
    (...).PDF
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 1.57 MB

Citation

Please use this url to cite or link to this publication:

MLA
Schrauwen, Jonathan, et al. “Iodine Enhanced Focused Ion Beam Etching of Silicon for Photonic Device Modification and Prototyping.” International Workshop on FIB for Photonics, 1st, Proceedings, edited by René M de Ridder et al., University of Twente, 2008, pp. 4–7.
APA
Schrauwen, J., Van Lysebettens, J., Vanhoutte, M., Van Thourhout, D., & Baets, R. (2008). Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping. In R. M. de Ridder, F. Ay, & L. J. Kauppinen (Eds.), International Workshop on FIB for Photonics, 1st, Proceedings (pp. 4–7). Enschede, The Netherlands: University of Twente.
Chicago author-date
Schrauwen, Jonathan, Jeroen Van Lysebettens, Michiel Vanhoutte, Dries Van Thourhout, and Roel Baets. 2008. “Iodine Enhanced Focused Ion Beam Etching of Silicon for Photonic Device Modification and Prototyping.” In International Workshop on FIB for Photonics, 1st, Proceedings, edited by René M de Ridder, Feridun Ay, and Lasse J Kauppinen, 4–7. Enschede, The Netherlands: University of Twente.
Chicago author-date (all authors)
Schrauwen, Jonathan, Jeroen Van Lysebettens, Michiel Vanhoutte, Dries Van Thourhout, and Roel Baets. 2008. “Iodine Enhanced Focused Ion Beam Etching of Silicon for Photonic Device Modification and Prototyping.” In International Workshop on FIB for Photonics, 1st, Proceedings, ed by. René M de Ridder, Feridun Ay, and Lasse J Kauppinen, 4–7. Enschede, The Netherlands: University of Twente.
Vancouver
1.
Schrauwen J, Van Lysebettens J, Vanhoutte M, Van Thourhout D, Baets R. Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping. In: de Ridder RM, Ay F, Kauppinen LJ, editors. International Workshop on FIB for Photonics, 1st, Proceedings. Enschede, The Netherlands: University of Twente; 2008. p. 4–7.
IEEE
[1]
J. Schrauwen, J. Van Lysebettens, M. Vanhoutte, D. Van Thourhout, and R. Baets, “Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping,” in International Workshop on FIB for Photonics, 1st, Proceedings, Einghoven, The Netherlands, 2008, pp. 4–7.
@inproceedings{625560,
  author       = {{Schrauwen, Jonathan and Van Lysebettens, Jeroen and Vanhoutte, Michiel and Van Thourhout, Dries and Baets, Roel}},
  booktitle    = {{International Workshop on FIB for Photonics, 1st, Proceedings}},
  editor       = {{de Ridder, René M and Ay, Feridun and Kauppinen, Lasse J}},
  isbn         = {{978-90-365-2678-4}},
  language     = {{eng}},
  location     = {{Einghoven, The Netherlands}},
  pages        = {{4--7}},
  publisher    = {{University of Twente}},
  title        = {{Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping}},
  year         = {{2008}},
}