A time-dependent model for reactive sputter deposition
- Author
- Koen Strijckmans (UGent) and Diederik Depla (UGent)
- Organization
- Abstract
- A time-dependent, spatially resolved model (RSD2013) for dc reactive magnetron sputtering is proposed. The model includes several processes such as reactive gas chemisorption on the target and the substrate, direct and knock-on implantation of reactive species in the target, subsurface compound formation in the target, the deposition of sputter material on the substrate and redeposition of sputtered material back on to the target. A full derivation and motivation of the model is given. This formulation of the model is contained within the software RSD2013, a user-friendly simulation tool for the reactive sputter process. To demonstrate this tool, a time-dependent simulation of a realistic system with an increasing number of available RSD2013 options is discussed.
- Keywords
- THIN-FILMS, PLASMA CHEMISTRY, TARGET, ALUMINUM, SIMULATION, VOLTAGE, OXYGEN, GAS, reactive sputtering, modeling, RSD2013, thin films
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-5722103
- MLA
- Strijckmans, Koen, and Diederik Depla. “A Time-Dependent Model for Reactive Sputter Deposition.” JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 47, no. 23, 2014, doi:10.1088/0022-3727/47/23/235302.
- APA
- Strijckmans, K., & Depla, D. (2014). A time-dependent model for reactive sputter deposition. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 47(23). https://doi.org/10.1088/0022-3727/47/23/235302
- Chicago author-date
- Strijckmans, Koen, and Diederik Depla. 2014. “A Time-Dependent Model for Reactive Sputter Deposition.” JOURNAL OF PHYSICS D-APPLIED PHYSICS 47 (23). https://doi.org/10.1088/0022-3727/47/23/235302.
- Chicago author-date (all authors)
- Strijckmans, Koen, and Diederik Depla. 2014. “A Time-Dependent Model for Reactive Sputter Deposition.” JOURNAL OF PHYSICS D-APPLIED PHYSICS 47 (23). doi:10.1088/0022-3727/47/23/235302.
- Vancouver
- 1.Strijckmans K, Depla D. A time-dependent model for reactive sputter deposition. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 2014;47(23).
- IEEE
- [1]K. Strijckmans and D. Depla, “A time-dependent model for reactive sputter deposition,” JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 47, no. 23, 2014.
@article{5722103,
abstract = {{A time-dependent, spatially resolved model (RSD2013) for dc reactive magnetron sputtering is proposed. The model includes several processes such as reactive gas chemisorption on the target and the substrate, direct and knock-on implantation of reactive species in the target, subsurface compound formation in the target, the deposition of sputter material on the substrate and redeposition of sputtered material back on to the target. A full derivation and motivation of the model is given. This formulation of the model is contained within the software RSD2013, a user-friendly simulation tool for the reactive sputter process. To demonstrate this tool, a time-dependent simulation of a realistic system with an increasing number of available RSD2013 options is discussed.}},
articleno = {{235302}},
author = {{Strijckmans, Koen and Depla, Diederik}},
issn = {{0022-3727}},
journal = {{JOURNAL OF PHYSICS D-APPLIED PHYSICS}},
keywords = {{THIN-FILMS,PLASMA CHEMISTRY,TARGET,ALUMINUM,SIMULATION,VOLTAGE,OXYGEN,GAS,reactive sputtering,modeling,RSD2013,thin films}},
language = {{eng}},
number = {{23}},
pages = {{13}},
title = {{A time-dependent model for reactive sputter deposition}},
url = {{http://doi.org/10.1088/0022-3727/47/23/235302}},
volume = {{47}},
year = {{2014}},
}
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