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Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments

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Abstract
Using a molecular dynamics model the crystallinity of MgxAlyOz thin films with a variation in the stoichiometry of the thin film is studied at operating conditions similar to the experimental operating conditions of a dual magnetron sputter deposition system. The films are deposited on a crystalline or amorphous substrate. The Mg metal content in the film ranged from 100% (i.e. MgO film) to 0% (i.e. Al2O3 film). The radial distribution function and density of the films are calculated. The results are compared with x-ray diffraction and transmission electron microscopy analyses of experimentally deposited thin films by the dual magnetron reactive sputtering process. Both simulation and experimental results show that the structure of the Mg-Al-O film varies from crystalline to amorphous when the Mg concentration decreases. It seems that the crystalline Mg-Al-O films have a MgO structure with Al atoms in between.

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Chicago
Georgieva, Violeta, Marta Martins Saraiva, Neeru Jehanathan, Oleg Lebelev, Diederik Depla, and Annemie Bogaerts. 2009. “Sputter-deposited Mg-Al-O Thin Films: Linking Molecular Dynamics Simulations to Experiments.” Journal of Physics D: Applied Physics 42 (6): 065107.
APA
Georgieva, V., Martins Saraiva, M., Jehanathan, N., Lebelev, O., Depla, D., & Bogaerts, A. (2009). Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments. Journal of Physics D: Applied Physics, 42(6), 065107.
Vancouver
1.
Georgieva V, Martins Saraiva M, Jehanathan N, Lebelev O, Depla D, Bogaerts A. Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments. Journal of Physics D: Applied Physics. IOP; 2009;42(6):065107.
MLA
Georgieva, Violeta, Marta Martins Saraiva, Neeru Jehanathan, et al. “Sputter-deposited Mg-Al-O Thin Films: Linking Molecular Dynamics Simulations to Experiments.” Journal of Physics D: Applied Physics 42.6 (2009): 065107. Print.
@article{533733,
  abstract     = {Using a molecular dynamics model the crystallinity of MgxAlyOz thin films with a variation in the stoichiometry of the thin film is studied at operating conditions similar to the experimental operating conditions of a dual magnetron sputter deposition system. The films are deposited on a crystalline or amorphous substrate. The Mg metal content in the film ranged from 100\% (i.e. MgO film) to 0\% (i.e. Al2O3 film). The radial distribution function and density of the films are calculated. The results are compared with x-ray diffraction and transmission electron microscopy analyses of experimentally deposited thin films by the dual magnetron reactive sputtering process. Both simulation and experimental results show that the structure of the Mg-Al-O film varies from crystalline to amorphous when the Mg concentration decreases. It seems that the crystalline Mg-Al-O films have a MgO structure with Al atoms in between.},
  author       = {Georgieva, Violeta and Martins Saraiva, Marta and Jehanathan, Neeru and Lebelev, Oleg and Depla, Diederik and Bogaerts, Annemie},
  issn         = {0022-3727},
  journal      = {Journal of Physics D: Applied Physics},
  language     = {eng},
  number       = {6},
  publisher    = {IOP},
  title        = {Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments},
  url          = {http://dx.doi.org/10.1088/0022-3727/42/6/065107},
  volume       = {42},
  year         = {2009},
}

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