Advanced search
1 file | 243.49 KB Add to list

Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering

Author
Organization
Abstract
Biaxially aligned YSZ (Yttria Stabilised Zirconia) layers were deposited by unbalanced magnetron sputtering, in a dual magnetron geometry. The unbalanced magnetrons were mounted in such a way that the angle between the target- and substrate normal was 55° for both magnetrons. The target-substrate distance was 13 cm for both magnetrons. A better homogeneity in deposition rate and biaxial alignment was obtained with respect to depositions with one unbalanced magnetron. The YSZ layers were characterized by XRD θ/2θ and (111) pole figures and showed a [001] out-of-plane orientation and a [110] in-plane orientation. The best biaxially aligned YSZ layers obtained so far, showed a FWHM of 21° in (111) pole figures. The influence of the magnet configuration (closed-field or mirror-field) and sputter conditions on the biaxial alignment was investigated. Gauss and Langmuir probe measurements were performed to investigate the influence of the magnet configuration and sputter conditions on the plasma density and the magnetic field lines.

Downloads

  • Mahieu2003.pdf
    • full text
    • |
    • open access
    • |
    • PDF
    • |
    • 243.49 KB

Citation

Please use this url to cite or link to this publication:

MLA
Mahieu, Stijn, Griet De Winter, Roger De Gryse, et al. “Deposition of Biaxially Aligned YSZ Layers by Dual Unbalanced Magnetron Sputtering.” Institute of Physics Conference Series. Ed. Antonello Andreone et al. Vol. 181. Taylor & Francis, 2004. Print.
APA
Mahieu, Stijn, De Winter, G., De Gryse, R., & Denul, J. (2004). Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering. In A. Andreone, G. P. Pepe, R. Cristiano, & G. Masullo (Eds.), Institute of Physics Conference Series (Vol. 181). Presented at the 6th European conference on Applied Superconductivity (EUCAS 2003), Taylor & Francis.
Chicago author-date
Mahieu, Stijn, Griet De Winter, Roger De Gryse, and Jurgen Denul. 2004. “Deposition of Biaxially Aligned YSZ Layers by Dual Unbalanced Magnetron Sputtering.” In Institute of Physics Conference Series, ed. Antonello Andreone, Giovanni Piero Pepe, Roberto Cristiano, and Giovanni Masullo. Vol. 181. Taylor & Francis.
Chicago author-date (all authors)
Mahieu, Stijn, Griet De Winter, Roger De Gryse, and Jurgen Denul. 2004. “Deposition of Biaxially Aligned YSZ Layers by Dual Unbalanced Magnetron Sputtering.” In Institute of Physics Conference Series, ed. Antonello Andreone, Giovanni Piero Pepe, Roberto Cristiano, and Giovanni Masullo. Vol. 181. Taylor & Francis.
Vancouver
1.
Mahieu S, De Winter G, De Gryse R, Denul J. Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering. In: Andreone A, Pepe GP, Cristiano R, Masullo G, editors. Institute of Physics Conference Series. Taylor & Francis; 2004.
IEEE
[1]
S. Mahieu, G. De Winter, R. De Gryse, and J. Denul, “Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering,” in Institute of Physics Conference Series, Sorrento, Italy, 2004, vol. 181.
@inproceedings{525013,
  abstract     = {Biaxially aligned YSZ (Yttria Stabilised Zirconia) layers were deposited by unbalanced magnetron sputtering, in a dual magnetron geometry. The unbalanced magnetrons were mounted in such a way that the angle between the target- and substrate normal was 55° for both magnetrons. The target-substrate distance was 13 cm for both magnetrons. A better homogeneity in deposition rate and biaxial alignment was obtained with respect to depositions with one unbalanced magnetron. The YSZ layers were characterized by XRD θ/2θ and (111) pole figures and showed a [001] out-of-plane orientation and a [110] in-plane orientation. The best biaxially aligned YSZ layers obtained so far, showed a FWHM of 21° in (111) pole figures. The influence of the magnet configuration (closed-field or mirror-field) and sputter conditions on the biaxial alignment was investigated. Gauss and Langmuir probe measurements were performed to investigate the influence of the magnet configuration and sputter conditions on the plasma density and the magnetic field lines.},
  author       = {Mahieu, Stijn and De Winter, Griet and De Gryse, Roger and Denul, Jurgen},
  booktitle    = {Institute of Physics Conference Series},
  editor       = {Andreone, Antonello and Pepe, Giovanni Piero and Cristiano, Roberto and Masullo, Giovanni},
  isbn         = {9780750309813},
  language     = {eng},
  location     = {Sorrento, Italy},
  pages        = {6},
  publisher    = {Taylor & Francis},
  title        = {Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering},
  volume       = {181},
  year         = {2004},
}