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Magnetron sputter deposition: linking discharge voltage with target properties

Diederik Depla (UGent) , Stijn Mahieu (UGent) and Roger De Gryse (UGent)
(2009) THIN SOLID FILMS. 517(9). p.2825-2539
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Keywords
Electron emission, Sputtering, Reactive deposition, INDUCED ELECTRON-EMISSION, THIN-FILMS, BULK MODULUS, SECONDARY ELECTRONS, OPTICAL-EMISSION, PLASMA, MODEL, IONS, TEMPERATURE, MIXTURES

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Citation

Please use this url to cite or link to this publication:

Chicago
Depla, Diederik, Stijn Mahieu, and Roger De Gryse. 2009. “Magnetron Sputter Deposition: Linking Discharge Voltage with Target Properties.” Thin Solid Films 517 (9): 2825–2539.
APA
Depla, D., Mahieu, S., & De Gryse, R. (2009). Magnetron sputter deposition: linking discharge voltage with target properties. THIN SOLID FILMS, 517(9), 2825–2539.
Vancouver
1.
Depla D, Mahieu S, De Gryse R. Magnetron sputter deposition: linking discharge voltage with target properties. THIN SOLID FILMS. 2009;517(9):2825–2539.
MLA
Depla, Diederik, Stijn Mahieu, and Roger De Gryse. “Magnetron Sputter Deposition: Linking Discharge Voltage with Target Properties.” THIN SOLID FILMS 517.9 (2009): 2825–2539. Print.
@article{524905,
  author       = {Depla, Diederik and Mahieu, Stijn and De Gryse, Roger},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  number       = {9},
  pages        = {2825--2539},
  title        = {Magnetron sputter deposition: linking discharge voltage with target properties},
  url          = {http://dx.doi.org/10.1016/j.tsf.2008.11.108},
  volume       = {517},
  year         = {2009},
}

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