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Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure

Rino Morent UGent, Nathalie De Geyter UGent, Sandra Van Vlierberghe UGent, Peter Dubruel UGent, Christophe Leys UGent and Etienne Schacht UGent (2009) Surface & Coatings Technology. 203(10-11). p.1366-1372
abstract
This paper presents results on the formation of coatings in an atmospheric pressure dielectric barrier discharge using hexamethyldisiloxane (HMDSO) as gaseous precursor. Plasma-polymerized films are deposited onto polyethylene terephthalate (PET) films using argon and argon/air mixtures as carrier gases. The chemical and physical properties of the obtained coatings are discussed in detail using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). FTIR and XPS results show that the composition of the gas phase and the chemical structure of the obtained coatings are clearly correlated. When pure argon is used as working gas, the film is polymeric with a structure close to [(CH3)(2)-Si-O](n), which means that the deposited films resemble PDMS. However, if plasma-polymerization occurs in argon/air mixtures, the deposited film is silica-like containing only few carbon atoms. These dense SiOx coatings generally exhibit high barrier properties, while pure HMDSO-derived films might be of importance for selective permeation. From this point of view, the capability of controlling the film composition by varying the operation conditions opens interesting perspectives. (C) 2008 Elsevier B.V. All rights reserved.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
Glow-Discharge, Deposition, Surface-Treatment, Thin-Films, Dielectric Barrier Discharge, Atmospheric pressure, Hexamethyldisiloxane, Plasma-polymerization, Dielectric barrier discharge, Coatings, Helium, Tetraethoxysilane, Nitrogen, Gas
journal title
Surface & Coatings Technology
Surf. Coat. Technol.
volume
203
issue
10-11
pages
1366 - 1372
publisher
Elsevier Science SA
place of publication
Lausanne, Switzerland
Web of Science type
Article
Web of Science id
000263618600012
JCR category
MATERIALS SCIENCE, COATINGS & FILMS
JCR impact factor
1.793 (2009)
JCR rank
3/16 (2009)
JCR quartile
1 (2009)
ISSN
0257-8972
DOI
10.1016/j.surfcoat.2008.11.008
language
English
UGent publication?
yes
classification
A1
id
520213
handle
http://hdl.handle.net/1854/LU-520213
date created
2009-03-17 13:15:44
date last changed
2009-04-01 09:21:34
@article{520213,
  abstract     = {This paper presents results on the formation of coatings in an atmospheric pressure dielectric barrier discharge using hexamethyldisiloxane (HMDSO) as gaseous precursor. Plasma-polymerized films are deposited onto polyethylene terephthalate (PET) films using argon and argon/air mixtures as carrier gases. The chemical and physical properties of the obtained coatings are discussed in detail using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). FTIR and XPS results show that the composition of the gas phase and the chemical structure of the obtained coatings are clearly correlated. When pure argon is used as working gas, the film is polymeric with a structure close to [(CH3)(2)-Si-O](n), which means that the deposited films resemble PDMS. However, if plasma-polymerization occurs in argon/air mixtures, the deposited film is silica-like containing only few carbon atoms. These dense SiOx coatings generally exhibit high barrier properties, while pure HMDSO-derived films might be of importance for selective permeation. From this point of view, the capability of controlling the film composition by varying the operation conditions opens interesting perspectives. (C) 2008 Elsevier B.V. All rights reserved.},
  author       = {Morent, Rino and De Geyter, Nathalie and Van Vlierberghe, Sandra and Dubruel, Peter and Leys, Christophe and Schacht, Etienne},
  issn         = {0257-8972},
  journal      = {Surface \& Coatings Technology},
  keyword      = {Glow-Discharge,Deposition,Surface-Treatment,Thin-Films,Dielectric Barrier Discharge,Atmospheric pressure,Hexamethyldisiloxane,Plasma-polymerization,Dielectric barrier discharge,Coatings,Helium,Tetraethoxysilane,Nitrogen,Gas},
  language     = {eng},
  number       = {10-11},
  pages        = {1366--1372},
  publisher    = {Elsevier Science SA},
  title        = {Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2008.11.008},
  volume       = {203},
  year         = {2009},
}

Chicago
Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, Peter Dubruel, Christophe Leys, and Etienne Schacht. 2009. “Organic-inorganic Behaviour of HMDSO Films Plasma-polymerized at Atmospheric Pressure.” Surface & Coatings Technology 203 (10-11): 1366–1372.
APA
Morent, R., De Geyter, N., Van Vlierberghe, S., Dubruel, P., Leys, C., & Schacht, E. (2009). Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure. Surface & Coatings Technology, 203(10-11), 1366–1372.
Vancouver
1.
Morent R, De Geyter N, Van Vlierberghe S, Dubruel P, Leys C, Schacht E. Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure. Surface & Coatings Technology. Lausanne, Switzerland: Elsevier Science SA; 2009;203(10-11):1366–72.
MLA
Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, et al. “Organic-inorganic Behaviour of HMDSO Films Plasma-polymerized at Atmospheric Pressure.” Surface & Coatings Technology 203.10-11 (2009): 1366–1372. Print.