Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge
- Author
- Rino Morent (UGent) , Nathalie De Geyter (UGent) , Sandra Van Vlierberghe (UGent) , Els Vanderleyden (UGent) , Peter Dubruel (UGent) , Christophe Leys (UGent) and Etienne Schacht (UGent)
- Organization
- Abstract
- The present work describes the plasma polymerisation of acrylic acid at atmospheric pressure. The influence of two operating parameters (monomer concentration and discharge power) on the properties of the deposited films is investigated. Results show that at a monomer concentration of 2.5 ppm and a discharge power of 9.5 W, the monomer is only slightly fragmented leading to a high amount of carboxylic acid groups on the deposited films. In contrast, when monomer concentration is decreased or discharge power increased, the incidence of monomer fragmentation processes is higher, leading to a lower amount of carboxylic acid groups on the films. This behaviour can be explained by a higher energy amount available per monomer molecule at low monomer concentrations and high discharge powers and a higher flux of positive ions attacking the surface at high discharge powers. Taking into account these results, it can be concluded that the deposition parameters should be carefully selected in order to preserve the stability of the monomer and thus obtain coatings with high carboxylic acid densities.
- Keywords
- Thin-Films, Helium, Glow-Discharge, Acrylic acid, Plasma polymerisation, Dielectric barrier discharge, Atmospheric pressure, Chemical-Vapor-Deposition, Plasma-Polymerized Films, Surface-Treatment, Acrylic-Acid, Frequency, Coatings, Nitrogen
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-520180
- MLA
- Morent, Rino, et al. “Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge.” Plasma Chemistry and Plasma Processing, vol. 29, no. 2, Springer, 2009, pp. 103–17, doi:10.1007/s11090-009-9167-1.
- APA
- Morent, R., De Geyter, N., Van Vlierberghe, S., Vanderleyden, E., Dubruel, P., Leys, C., & Schacht, E. (2009). Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge. Plasma Chemistry and Plasma Processing, 29(2), 103–117. https://doi.org/10.1007/s11090-009-9167-1
- Chicago author-date
- Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, Els Vanderleyden, Peter Dubruel, Christophe Leys, and Etienne Schacht. 2009. “Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge.” Plasma Chemistry and Plasma Processing 29 (2): 103–17. https://doi.org/10.1007/s11090-009-9167-1.
- Chicago author-date (all authors)
- Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, Els Vanderleyden, Peter Dubruel, Christophe Leys, and Etienne Schacht. 2009. “Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge.” Plasma Chemistry and Plasma Processing 29 (2): 103–117. doi:10.1007/s11090-009-9167-1.
- Vancouver
- 1.Morent R, De Geyter N, Van Vlierberghe S, Vanderleyden E, Dubruel P, Leys C, et al. Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge. Plasma Chemistry and Plasma Processing. 2009;29(2):103–17.
- IEEE
- [1]R. Morent et al., “Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge,” Plasma Chemistry and Plasma Processing, vol. 29, no. 2, pp. 103–117, 2009.
@article{520180, abstract = {{The present work describes the plasma polymerisation of acrylic acid at atmospheric pressure. The influence of two operating parameters (monomer concentration and discharge power) on the properties of the deposited films is investigated. Results show that at a monomer concentration of 2.5 ppm and a discharge power of 9.5 W, the monomer is only slightly fragmented leading to a high amount of carboxylic acid groups on the deposited films. In contrast, when monomer concentration is decreased or discharge power increased, the incidence of monomer fragmentation processes is higher, leading to a lower amount of carboxylic acid groups on the films. This behaviour can be explained by a higher energy amount available per monomer molecule at low monomer concentrations and high discharge powers and a higher flux of positive ions attacking the surface at high discharge powers. Taking into account these results, it can be concluded that the deposition parameters should be carefully selected in order to preserve the stability of the monomer and thus obtain coatings with high carboxylic acid densities.}}, author = {{Morent, Rino and De Geyter, Nathalie and Van Vlierberghe, Sandra and Vanderleyden, Els and Dubruel, Peter and Leys, Christophe and Schacht, Etienne}}, issn = {{0272-4324}}, journal = {{Plasma Chemistry and Plasma Processing}}, keywords = {{Thin-Films,Helium,Glow-Discharge,Acrylic acid,Plasma polymerisation,Dielectric barrier discharge,Atmospheric pressure,Chemical-Vapor-Deposition,Plasma-Polymerized Films,Surface-Treatment,Acrylic-Acid,Frequency,Coatings,Nitrogen}}, language = {{eng}}, number = {{2}}, pages = {{103--117}}, publisher = {{Springer}}, title = {{Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge}}, url = {{http://doi.org/10.1007/s11090-009-9167-1}}, volume = {{29}}, year = {{2009}}, }
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